Chromium silicon monoxide

HCID 57464841CAS 37264-20-3

Grundinformationen

Standard-SMILES
[Cr].[O+]#[Si-]
InChIKey
VBIIZNCPFKFDSM-UHFFFAOYSA-N
Summenformel
CrOSi
Durchschnittliche Molmasse
96,081 g/mol

Namen und Bezeichner

Bevorzugter Name
Chromium silicon monoxide
IUPAC
chromium;oxoniumylidynesilanide
Englischer Name
Chromium silicon monoxide
Summenformel
CrOSi
Molmasse
96.08

Namen und Synonyme

CHROMIUM SILICON MONOXIDE37264-20-356488-64-3chromium;oxoniumylidynesilanideSCHEMBL29626836ASAMIKIYIFIKFS-UHFFFAOYSA-NChromium silicon monoxide, 99.8+% (metals basis)

Datenbank-Bezeichner

CAS
37264-20-3、56488-64-3
PubChem CID
57464841
EC Number
677-387-3、677-389-4

Eigenschaften

Berechnete Struktureigenschaften

Polarare Oberfläche (TPSA)
1 Ų
H-Brücken-Donoren
0
H-Brücken-Akzeptoren
1
Frei drehbare Bindungen
0
Schwere Atome
3

Physikochemische Eigenschaften

Aggregatzustand
Sintered Pieces
Wasserlöslichkeit
Insoluble in water.

Sicherheit und Regulatorisches

GHS-Klassifizierung

GHS Classification · 6 Einträge

Danger

H317 (100%): May cause an allergic skin reaction [Warning Sensitization, Skin]

P233, P260, P261, P271, P272, P280, P284, P302+P352, P304+P340, P321, P333+P317, P342+P316, P362+P364, P403, and P501 (click each P-code to see the statement)

Aggregated GHS information provided per 4 reports by companies from 1 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.

Danger

H317 (100%): May cause an allergic skin reaction [Warning Sensitization, Skin]

Sicherheitsdaten

tsca
Yes

Chemie und Industrie

Anwendungen · 1 Eintrag

VerwendenChromium silicon monoxide is used for vacuum deposition. Significantly used as resistor,a relationship between film structure and electrical conductivity of mixture of chromium and silicon monoxide was found for film compositions which were almost metallic to almost insulating. Chromium-silicon monoxide cermet films Commercially available 70 %-30 % Cr-SiO pellets were deposited on glass substrates by flash evaporation, anticipating a chromium island structure in an SiO matrix which would enhance film stability.

Anbieter5 Anbieter

阿法埃莎(中国)化学有限公司400-6106006 · [email protected]
安耐吉化学&3A(安徽泽升科技股份有限公司)400-0056266 · [email protected]
Alfa Chemistry1-516-6625404 · [email protected]
爆牛贸易重庆有限公司+86-023-6139-8061 +86-86-13650506873 · [email protected]
XIAMEN AMITY INDUSTRY AND TRADE CO., LTD.+8618950047208 · [email protected]

Zugehörige Reaktionen

0

Keine Reaktionsaufzeichnungen unter den aktuellen Filterkriterien.

Verknüpfte Notizen

Wird geladen…