Beteiligte Stoffe
| Rolle | Name | HCID | Einwaage |
|---|
| Edukt | Hexachlorodisilane | HCID 83497 | — |
| Edukt | Lithium N-methylmethanaminide | HCID 5152226 | — |
| Edukt | (2S,3S)-2-[4-[(1R)-1-amino-2-hydroxyethyl]triazol-1-yl]-1-[4-[4-[4-[(2S,3S)-2-[4-[(1R)-1-amino-2-hydroxyethyl]triazol-1-yl]-3-methylpentanoyl]piperazin-1-yl]-6-[2-[2-(2-prop-2-ynoxyethoxy)ethoxy]ethylamino]-1,3,5-triazin-2-yl]piperazin-1-yl]-3-methylpentan-1-one;hydrochloride | HCID 16745346 | — |
| Edukt | Pentakis(dimethylamino) chloro disilane | HCID 86638304 | — |
| Lösungsmittel | Hexane | HCID 8058 | — |
| Produkt | Hexakis(dimethylamino) disilane | HCID 22053281 | — |
Reaktionsschritte
The synthesis of ClSi2(NMe2)5 has been done from the ammonolysis of hexachlorodisilane and lithium dimethylamide. Hexachlorodisilane (HCD) is used as the starting material so that the Si-Si direct bond remains in the molecule. n-hexane is used as a solvent and cooled at 0° C. A mixture of pentakis(dimethylamino) chloro disilane and hexakis(dimethylamino) disilane is obtained. Lithium dimethylamide is added to form a “lithium dimethylamide solution”. HCD is added dropwise in the 0° C. lithium dimethylamide solution. Then the solution is stirred for 2 h at 0° C. then for 15 h at RT. The salt LiCl is then removed from the solution, and the n-hexane removed in vacuo. The resulting ClSi2(NMe2)5 and other byproducts are separated by fractional distillation.
Herkunft & Nachweise
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patentnummer | US08153832B2 |
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| Quelldatensatz | uspto-grants-2012_04 |
|---|
| ORD ID | ord-00e69f087e304ee28f73864974a68a5b |
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| Quellennotiz | uspto-grants-2012_04 |
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