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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 1692151생성일: 2026년 10월 24일

Hexachlorodisilane → Hexakis(dimethylamino) disilane

https://huagongshe.com/ko/reaction/1692151

반응식

참여 물질

역할이름HCID투입량
반응물HexachlorodisilaneHCID 83497—
반응물Lithium N-methylmethanaminideHCID 5152226—
반응물(2S,3S)-2-[4-[(1R)-1-amino-2-hydroxyethyl]triazol-1-yl]-1-[4-[4-[4-[(2S,3S)-2-[4-[(1R)-1-amino-2-hydroxyethyl]triazol-1-yl]-3-methylpentanoyl]piperazin-1-yl]-6-[2-[2-(2-prop-2-ynoxyethoxy)ethoxy]ethylamino]-1,3,5-triazin-2-yl]piperazin-1-yl]-3-methylpentan-1-one;hydrochlorideHCID 16745346—
반응물Pentakis(dimethylamino) chloro disilaneHCID 86638304—
용매HexaneHCID 8058—
생성물Hexakis(dimethylamino) disilaneHCID 22053281—

반응 조건

온도0 °C

반응 단계

The synthesis of ClSi2(NMe2)5 has been done from the ammonolysis of hexachlorodisilane and lithium dimethylamide. Hexachlorodisilane (HCD) is used as the starting material so that the Si-Si direct bond remains in the molecule. n-hexane is used as a solvent and cooled at 0° C. A mixture of pentakis(dimethylamino) chloro disilane and hexakis(dimethylamino) disilane is obtained. Lithium dimethylamide is added to form a “lithium dimethylamide solution”. HCD is added dropwise in the 0° C. lithium dimethylamide solution. Then the solution is stirred for 2 h at 0° C. then for 15 h at RT. The salt LiCl is then removed from the solution, and the n-hexane removed in vacuo. The resulting ClSi2(NMe2)5 and other byproducts are separated by fractional distillation.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US08153832B2
출처 데이터셋uspto-grants-2012_04
ORD IDord-00e69f087e304ee28f73864974a68a5b
출처 메모uspto-grants-2012_04