HRID1191213

反应详情

EQUATION

反应方程式

HRID 1191213 的结构方程式

CONDITIONS

反应条件

温度
65 °C

PROCEDURE

实验过程

A solution of 5-tert-butyl-4-chloro-2-methyl-2H-pyrazole-3-carboxylic acid [5-bromo-3-(4-methoxy-benzylamino)-pyrazin-2-yl]-amide (28 mg, 0.04 mmol, prepared as described in the previous step) in TFA (3.5 mL) was stirred at 65° C. for 3 h. The resulting mixture was allowed to cool to room temperature, TFA was removed in vacuo and the resulting residue was dissolved in EtOAc (10 mL) and washed with saturated NaHCO3 (20 mL). EtOAc layer was separated, dried (Na2SO4), and concentrated in vacuo. The resulting residue was dissolved in HOAc (3.5 mL) and stirred at 100° C. overnight. The resulting mixture was allowed to cool to room temperature and the HOAc was removed in vacuo. The resulting residue was dissolved in EtOAc (10 mL) and washed with saturated NaHCO3 (10 mL). EtOAc layer was separated, dried (Na2SO4), and concentrated in vacuo. The resulting residue was purified on silica 0:100-50:50 EtOAc-hexane to yield 2-(5-tert-butyl-4-chloro-2-methyl-2H-pyrazol-3-yl)-6-(2-trifluoromethyl-phenyl)-1H-imidazo[4,5-b]pyrazine. 1H-NMR (CD3OD) δ: 8.53-8.57 (br s, 1H), 7.82-7.86 (m, 1H), 7.68-7.74 (m, 1H), 7.61-7.67 (m, 1H), 7.57-7.60 (m, 1H), 4.19 (s, 3H), 1.43 (s, 9H). Mass Spectrum (LCMS, ESI pos.): Calculated for C20H18ClF3N6: 435.1 (M+H); Measured: 435.1.

WORKUP

后处理

  1. temperatureto cool to room temperature
  2. customTFA was removed in vacuo
  3. dissolutionthe resulting residue was dissolved in EtOAc (10 mL)
  4. washwashed with saturated NaHCO3 (20 mL)
  5. customEtOAc layer was separated
  6. dry with materialdried (Na2SO4)
  7. concentrationconcentrated in vacuo
  8. dissolutionThe resulting residue was dissolved in HOAc (3.5 mL)
  9. stirringstirred at 100° C. overnight
  10. temperatureto cool to room temperature
  11. customthe HOAc was removed in vacuo
  12. dissolutionThe resulting residue was dissolved in EtOAc (10 mL)
  13. washwashed with saturated NaHCO3 (10 mL)
  14. customEtOAc layer was separated
  15. dry with materialdried (Na2SO4)
  16. concentrationconcentrated in vacuo
  17. customThe resulting residue was purified on silica 0:100-50:50 EtOAc-hexane