HRID2287922
反应详情
EQUATION
反应方程式
REACTANTS
反应物
PRODUCTS
生成物
CONDITIONS
反应条件
- 温度
- 650 °C
PROCEDURE
实验过程
A 0.4M solution of Cu(OAc)2 (0.5 g) in pyridine/HOAc (~4:1) was prepared at a temperature of approximately 120° C., generating a homogenous precursor solution. Thin films were deposited and heat treated on a 300° C. hot plate and then heated to 650° C. to form the copper oxide thin film.
WORKUP
后处理
- temperatureheat
- additiontreated on a 300° C. hot plate