HRID2287922

反应详情

EQUATION

反应方程式

HRID 2287922 的结构方程式

CONDITIONS

反应条件

温度
650 °C

PROCEDURE

实验过程

A 0.4M solution of Cu(OAc)2 (0.5 g) in pyridine/HOAc (~4:1) was prepared at a temperature of approximately 120° C., generating a homogenous precursor solution. Thin films were deposited and heat treated on a 300° C. hot plate and then heated to 650° C. to form the copper oxide thin film.

WORKUP

后处理

  1. temperatureheat
  2. additiontreated on a 300° C. hot plate