HRID490880

反应详情

EQUATION

反应方程式

HRID 490880 的结构方程式

AUXILIARIES

试剂、催化剂与溶剂

1

CONDITIONS

反应条件

温度
95 °C

PROCEDURE

实验过程

Intermediate 11 (0.05 g) was dissolved in thionyl chloride (1 ml) and the mixture was heated at reflux (95° C.) with stirring for 1 h. After cooling to room temperature, excess thionyl chloride was removed by evaporation under reduced pressure and the resultant solid dissolved in anhydrous acetonitrile (0.5 ml). This solution was added to a solution of isobutyric acid hydrazide (0.025 g) and diisopropylethylamine (0.058 ml) in anhydrous acetonitrile (1 ml), and the mixture stirred for a further 1.5 h. The mixture was concentrated in vacuo and the residue treated directly with phosphorus oxychloride (2 ml). The resultant solution was stirred and heated at reflux (120° C.) for 2 h, then allowed to cool and concentrated in vacuo. The residue was applied to an SPE cartridge (silica, 5 g) which was eluted sequentially with a gradient of EtOAc:cyclohexanI (i) 1:16, (ii) 1:8, (iii) 1:4, (iv) 1:2, (v) 1:1 and (vi) 1:0. Fractions containing desired material were combined and concentrated in vacuo to afford Intermediate 13 (0.049 g). LCMS showed MH+=292; TRET=2.96 min.

WORKUP

后处理

  1. temperaturethe mixture was heated
  2. temperatureAfter cooling to room temperature
  3. customexcess thionyl chloride was removed by evaporation under reduced pressure
  4. dissolutionthe resultant solid dissolved in anhydrous acetonitrile (0.5 ml)
  5. additionThis solution was added to a solution of isobutyric acid hydrazide (0.025 g) and diisopropylethylamine (0.058 ml) in anhydrous acetonitrile (1 ml)
  6. stirringthe mixture stirred for a further 1.5 h
  7. concentrationThe mixture was concentrated in vacuo
  8. additionthe residue treated directly with phosphorus oxychloride (2 ml)
  9. stirringThe resultant solution was stirred
  10. temperatureheated
  11. temperatureat reflux (120° C.) for 2 h
  12. temperatureto cool
  13. concentrationconcentrated in vacuo
  14. washwas eluted sequentially with a gradient of EtOAc
  15. additionFractions containing desired material
  16. concentrationconcentrated in vacuo