乙烯基二茂铁 → HCID 178477623，化合物

HRID 1856387

反应方程式

HRID 1856387 反应方程式
[CH:1]([C-:3]1[CH:7]=[CH:6][CH:5]=[CH:4]1)=[CH2:2].[CH-:8]1[CH:12]=[CH:11][CH:10]=[CH:9]1.[Fe+2:13].[C:14]([OH:17])(=[S:16])[CH3:15]>C1C=CC=CC=1>[C-:3]1([CH2:1][CH2:2][O:17][C:14](=[S:16])[CH3:15])[CH:7]=[CH:6][CH:5]=[CH:4]1.[CH-:8]1[CH:12]=[CH:11][CH:10]=[CH:9]1.[Fe+2:13]

参与物

4

反应物 2

HCID 15807218乙烯基二茂铁HCID 178418634HCID 178418634，化合物

产物 1

HCID 178477623HCID 178477623，化合物

试剂、催化剂与溶剂 1

HCID 241苯溶剂

实验过程

In a typical experiment 2.12g (0.01 mol) of purified vinyl ferrocene and 0.76 (0.01 mol) of thioacetic acid were dissolved in 30 ml of GC spectrophotometric quality benzene and placed in a pyrex photoreactor fitted with a fritted purging tube and reflux condenser. The solution was purged 45 minutes with helium prior and during irradiation of 1.75×1019 photon/min. from a Hanovia 100 watt type SOL high pressure quartz mercury vapor lamp. No change in the infrared bands of the mercaptans (3.9μ) and vinyl groups (6.18μ) nor any product formation could be observed by thin layer chromatography during a photolysis time of up to eight hours. It was observed that photo-decomposition of vinyl ferrocene occurred (formation of dark brown precipitate) along with protection of thioacetic acid from the ultraviolet light.

后处理

  1. customfitted with a fritted purging tube
  2. temperaturereflux condenser
  3. customThe solution was purged 45 minutes with helium
  4. customduring irradiation of 1.75×1019 photon/min
  5. customup to eight hours

来源与证据

ORD记录
ord-40d3ee5830ea4665a0d3b083e37f5364
来源数据集
uspto-grants-1980_08
专利号
US04219490

关联笔记

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