结构:CCC[Si](Cl)(CCC)CCC
HCID70445

Chlorotripropylsilane

chloro(tripropyl)silane

C9H21ClSi192.8 g/molCAS 995-25-5

IDENTITY

结构与身份

标准 SMILES
CCC[Si](Cl)(CCC)CCC
InChIKey
ACTAPAGNZPZLEF-UHFFFAOYSA-N
分子式
C9H21ClSi
平均分子量
192.8 g/mol
单同位素质量
192.1101049

COMPUTED

结构计算性质

已同步
极性表面积
0 Ų
氢键供体
0
氢键受体
0
可旋转键
6
重原子
11
形式电荷
0
复杂度
76

PROPERTIES

实验与物化性质

来源:PubChem
Kovats Retention Index

980;984

GHS

GHS 分类

来源:PubChem
GHS Classification

Danger

H314 (100%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation];H335 (90.7%): May cause respiratory irritation [Warning Specific target organ toxicity, single exposure; Respiratory tract irritation]

P260, P261, P264, P271, P280, P301+P330+P331, P302+P361+P354, P304+P340, P305+P354+P338, P316, P319, P321, P363, P403+P233, P405, and P501 (click each P-code to see the statement)

Aggregated GHS information provided per 43 reports by companies from 3 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.;Information may vary between notifications depending on impurities, additives, and other factors. The percentage value in parenthesis indicates the notified classification ratio from companies that provide hazard codes. Only hazard codes with percentage values above 10% are shown. For more detailed information, please visit ECHA C&L website.

HAZARDS

危害信息

来源:PubChem
Hazard Classes and Categories

Skin Corr. 1A (100%);STOT SE 3 (90.7%)

USES

用途与制造

来源:PubChem
General Manufacturing Information

Silane, chlorotripropyl-: ACTIVE

ALIASES

名称与别名

32
Chlorotripropylsilanetri-n-PropylchlorosilaneSilane, chlorotripropyl-EINECS 213-624-5NSC 139864DTXSID6061365RefChem:125545DTXCID3049128213-624-5ACTAPAGNZPZLEF-UHFFFAOYSA-N995-25-5Chlorotri-n-propylsilaneTripropylchlorosilanechloro(tripropyl)silanetripropylsilyl chlorideMFCD000005086NU6KQJ2AYNSC-139864NSC139864Chlorotri(propyl)silane

REACTIONS

参与反应

4
HRID93671

Training data from https://doi.org/10.1039/C8SC04228D (2/10)

作为反应物
HRID 93671 方程式

Training data from https://doi.org/10.1039/C8SC04228D (2/10) · 10.1039/C8SC04228D

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