25817-87-2COc1nc(N2CCN(C(=O)C=CCN(C)C)C(CC#N)C2)c2cc(Cl)c(-c3cc(O)cc4ccccc34)c(F)c2n1.COc1nc(N2CCN(C(=O)C=CCN3CCCCC3)C(CC#N)C2)c2cc(Cl)c(-c3cc(O)cc4ccccc34)c(F)c2n1AIRRSBIRSIPRGM-UHFFFAOYSA-N25817-87-2Sicherheitsangaben dienen nur zur Orientierung und ersetzen weder das Sicherheitsdatenblatt (SDB) des Lieferanten noch geltende Vorschriften oder eine fachliche Bewertung.
Warning
H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]
P261, P264, P264+P265, P271, P280, P302+P352, P304+P340, P305+P351+P338, P319, P321, P332+P317, P337+P317, P362+P364, P403+P233, P405, and P501 (click each P-code to see the statement)
The GHS information provided by 1 company from 1 notification to the ECHA C&L Inventory.
VerwendenHafnium nitride exhibits outstanding mechanical, electrical, optical, high-temperature resistance, and corrosion resistance properties, making it highly valuable in fields such as mechanical manufacturing and microelectronics.Nano-sized hafnium nitride finds widespread applications in the semiconductor, optoelectronics, and precision machining industries. In particular, nano-HfN thin films show great potential as high-efficiency anti-reflective protective coatings for optical windows, especially for critical optical components in aerospace systems.
synthetischeHafnium nitride can be produced either through the direct reaction of hafnium with nitrogen at 900°C, or via the reaction of hafnium halides with ammonia or a nitrogen-hydrogen gas mixture.
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