HuagongsheHuagongshe Chemie-Druckbericht · Nur für Forschungszwecke
(3-Mercaptopropyl)ammoniumchlorid
3-aminopropane-1-thiol hydrochloride · JACS-7211-54-3 · 3-Amino-1-propanethiolHCl · 3-aMinopropane-1-thiolHCL · Homocysteamine hydrochloride · 3-Mercaptopropylamine hydrochloride · (3-mercaptopropyl)ammonium chloride · 3-Mercaptopropan-1-aMiniuM chloride
Identifikatoren & physikalische Daten
| CAS No. | 7211-54-3 |
|---|---|
| Summenformel | C3H10ClNS |
| Durchschnittliche Molmasse | 127,64 g/mol |
| Monoisotopische Masse | 127,022248 g/mol |
| SMILES | Cl.NCCCS |
| InChIKey | GMEDUXHKSSWXSL-UHFFFAOYSA-N |
| PubChem CID | 197870 |
| EC No. | 230-593-3 |
| DTXSID | DTXSID40992834 |
| Lokaler Name | (3-Mercaptopropyl)ammoniumchlorid |
Chemische & physikalische Eigenschaften
| Polarare Oberfläche (TPSA) | 27 |
|---|---|
| H-Brücken-Donoren | 3 |
| H-Brücken-Akzeptoren | 2 |
| Frei drehbare Bindungen | 2 |
| Schwere Atome | 6 |
| Formalladung | 0 |
| Komplexität | 16,4 |
| Schmelzpunkt | 79-80℃ |
| Lagerbedingungen | Inert atmosphere,Store in freezer, under -20°C |
| Aggregatzustand | solid |
| InChI | 1S/C3H9NS.ClH/c4-2-1-3-5/h5H,1-4H21H |
| InChIKey | GMEDUXHKSSWXSL-UHFFFAOYSA-N |
| SMILES | Cl.NCCCS |
Sicherheit & Vorschriften
| GHS-Einstufung | WarningH315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]P261, P264, P264+P265, P271, P280, P302+P352, P304+P340, P305+P351+P338, P319, P321, P332+P317, P337+P317, P362+P364, P403+P233, P405, and P501 (click each P-code to see the statement)Aggregated GHS information provided per 40 reports by companies from 3 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies. |
|---|---|
| Hazard Classes and Categories | Skin Irrit. 2 (100%) |
| Wassergefährdungsklasse (WGK) | 3 |
| UN-Transportnummer | UN 3335 |
| R-Sätze (R) | 36/37/38 |
| Gefahrensymbole | Xi |
| Sicherheitshinweise (S) | 26 |
| Lagerklasse | 11 - Combustible Solids |
| Gefahrenklasse | Eye Irrit. 2Skin Irrit. 2STOT SE 3 |
Anwendungen & Verwendung
Verwenden
APT can be used to form a plasmonic tunneling gap through coulomb blockage which can be potentially used in high-speed switching devices. It can also form a SAM on gold nanorods(AuNR) for controlled spacing and photon absorption in photovoltaic and other photo-sensors based devices.