Grundinformationen
- Standard-SMILES
C=C(C)C(=O)OC(C)OCC- InChIKey
HVBADOTWUFBZMF-UHFFFAOYSA-N- Summenformel
- C8H14O3
- Durchschnittliche Molmasse
- 158,19 g/mol
- Monoisotopische Masse
- 158,09429431
Namen und Bezeichner
- Bevorzugter Name
- 1-Ethoxyethyl Methacrylate (stabilized with MEHQ)
- IUPAC
- 1-ethoxyethyl 2-methylprop-2-enoate
- Englischer Name
- 2-Propenoic acid, 2-methyl-, 1-ethoxyethyl ester
- Summenformel
- C8H14O3
- Molmasse
- 158.2
Namen und Synonyme
1-Ethoxyethyl Methacrylate (stabiliZed with MEHQ)RefChem:432261890-694-91-ethoxyethyl methacrylate51920-52-61-Ethoxyethyl 2-methylprop-2-enoate2-Propenoic acid, 2-methyl-, 1-ethoxyethyl esterstarbld00080021-ethoxyethylmethacrylateSCHEMBL361001-(ethoxy)ethyl methacrylate2-Ethoxy-2-ethyl Methacrylate
Weitere Namen anzeigen
DK7991-Ethanol-ethanol methacrylate1-ethoxyethyl2-methylprop-2-enoate51920-52-6 2-Propenoic acid, 2-methyl-, 1-ethoxyethyl ester
SCHEMBL9555207SCHEMBL27479400DTXSID90603387MFCD28362058FE161947SY248759DB-162527E72712
Datenbank-Bezeichner
- CAS
51920-52-6- PubChem CID
- 20193345
- DTXSID
DTXSID90603387- EC Number
- 890-694-9
- Nikkaji
- J981.828F
Eigenschaften
Berechnete Struktureigenschaften
- XLogP
- 2,2
- Polarare Oberfläche (TPSA)
- 35,5 Ų
- H-Brücken-Donoren
- 0
- H-Brücken-Akzeptoren
- 3
- Frei drehbare Bindungen
- 5
- Schwere Atome
- 11
- Formalladung
- 0
- Komplexität
- 151
Physikochemische Eigenschaften
- Siedepunkt
- 180.5 · 180.5±23.0 °C(Predicted)
- Dichte
- 0.954 · 0.954±0.06 g/cm3(Predicted)
- InChI
- InChI=1S/C8H14O3/c1-5-10-7(4)11-8(9)6(2)3/h7H,2,5H2,1,3-4H3
- InChIKey
- HVBADOTWUFBZMF-UHFFFAOYSA-N
- SMILES
- C(OC(OCC)C)(=O)C(C)=C
Sicherheit und Regulatorisches
GHS-Klassifizierung
GHS Classification
Warning
H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]
P264, P264+P265, P280, P302+P352, P305+P351+P338, P321, P332+P317, P337+P317, and P362+P364 (click each P-code to see the statement)
The GHS information provided by 1 company from 1 notification to the ECHA C&L Inventory.
Gefahrenhinweise
Hazard Classes and CategoriesSkin Irrit. 2 (100%)
Chemie und Industrie
Anwendungen
Verwenden2-Propenoic acid, 2-methyl-, 1-ethoxyethyl ester is used as a photoresist monomer.
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