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HCID 75404Erstellt: 3. November 2026

1,3,5,7-Tetramethylcyclotetrasiloxane

D4H · TMCTS · 1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE · Tetramethylcyclotetrasiloxane · 2,4,6,8-Tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane · H-4 · H4R · HH4R

https://huagongshe.com/de/chemical/75404

Molekülstruktur von 1,3,5,7-Tetramethylcyclotetrasiloxane

Identifikatoren & physikalische Daten

CAS No.2370-88-9
SummenformelC4H16O4Si4
Durchschnittliche Molmasse240,51 g/mol
Monoisotopische Masse240,01256511 g/mol
SMILESC[SiH]1O[SiH](C)O[SiH](C)O[SiH](C)O1
InChIKeyBQYPERTZJDZBIR-UHFFFAOYSA-N
PubChem CID75404
EC No.219-137-4
DTXSIDDTXSID10870958

Chemische & physikalische Eigenschaften

Polarare Oberfläche (TPSA)36,9
H-Brücken-Donoren0
H-Brücken-Akzeptoren4
Frei drehbare Bindungen0
Schwere Atome12
Formalladung0
Komplexität99
StoffklassenMetals -> Metalloid Compounds (Silicon)
SpringerMaterials PropertiesOptical coefficient
Dampfdruck7.02 [mmHg]0.05-479Pa at 20℃
Physical DescriptionLiquidColorless liquid with an odor like ether[Air Products MSDS]
Schmelzpunkt−69 °C (lit.)
Siedepunkt134 °C
Dichte0.99
Brechungsindex1.39
Flammpunkt24 °C
Lagerbedingungen2-8°C
Aggregatzustandclear liquid
FarbeColorless to Almost colorless
Wichte0.991
LöslichkeitMiscible with most organic solvents. Immiscible with water.
BRN1787074
InChI1S/C4H16O4Si4/c1-9-5-10(2)7-12(4)8-11(3)6-9/h9-12H,1-4H3
InChIKeyBQYPERTZJDZBIR-UHFFFAOYSA-N
SMILESC[SiH]1O[SiH](C)O[SiH](C)O[SiH](C)O1
LogP (Verteilungskoeffizient)-2.4-5.54 at 25℃
CAS Datenbank2370-88-9(CAS DataBase Reference)
EPA chemische InformationenCyclotetrasiloxane, 2,4,6,8-tetramethyl- (2370-88-9)

Sicherheit & Vorschriften

GHS-EinstufungWarningH226 (100%): Flammable liquid and vapor [Warning Flammable liquids]P210, P233, P240, P241, P242, P243, P280, P303+P361+P353, P370+P378, P403+P235, and P501 (click each P-code to see the statement)Aggregated GHS information provided per 2298 reports by companies from 5 notifications to the ECHA C&L Inventory.
Regulatorische InformationenChemical: Cyclotetrasiloxane, 2,4,6,8-tetramethyl-Cyclotetrasiloxane, 2,4,6,8-tetramethyl- is listed on the EPA's Chemical Data Reporting (CDR) system. Manufacturers and importers of Cyclotetrasiloxane, 2,4,6,8-tetramethyl- are required to report information about their production and use of this chemical to the EPA under the Toxic Substances Control Act (TSCA). (40 eCFR Part 711)Status: Active Update: 15-07-2022 https://echa.europa.eu/registration-dossier/-/registered-dossier/15844Cyclotetrasiloxane, 2,4,6,8-tetramethyl-: Does not have an individual approval but may be used as a component in a product covered by a group standard. It is not approved for use as a chemical in its own right.
GefahrenübersichtDecomposed by water (may evolve hydrogen gas)An irritantHarmful by ingestion and skin absorption[Air Products MSDS] See Octamethylcyclotetrasiloxane.
Hazard Classes and CategoriesFlam. Liq. 3 (100%)
F10-21
Wassergefährdungsklasse (WGK)3
TSCA-Inventar-StatusTSCA listed
UN-TransportnummerUN 1993 3/PG 3
Zollcode29319090
R-Sätze (R)10-36
GefahrensymboleXi
Sicherheitshinweise (S)16-26-36
Gefahrenklasse3Flam. Liq. 3
VerpackungsgruppeIII
Lagerklasse3 - Flammable liquids

Anwendungen & Verwendung

Beschreibung

2, 4, 6, 8-TETRAMETHYLCYCLOTETRASILOXANE can be used as the precursor for the deposition of polysiloxane, cyclic siloxane, silicon dioxide, and gate dielectrics in thin-film transistors (TFT) (for example, for the preparation of ultralow dielectric constant pSiCOH film), and is a component of photochemically formed SiOX monolayers on TiO. It is a good impregnant of photoelectric material. It can be used for the manufacturing of modified siloxane with defined hydrogen content and chain quality.

Verwenden

2,4,6,8-Tetramethylcyclotetrasiloxane can occur addition reaction with unsaturated alkenes, so it’s utilized widely to synthesize variety functional reactive silicone fluids which is used to form silicone block copolymer, or used as crosslinker of vinyl addition silicone rubber. Tetramethyl-cyclotetrasiloxane is a good impregnant of photoelectric material. It is used to manufacture of modified siloxane with defined hydrogen content and chain quantity. It is also used in production of silicone polymers and acts as a precursor for the deposition of polysiloxane, cyclic siloxane, silicon dioxide, oxycarbide thin films with low dielectric constant for microelectronics and semiconductors.