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HuagongsheHuagongshe Chemie-Druckbericht · Nur für Forschungszwecke
HRID 1095207Erstellt: 25. Oktober 2026

Trifluoromethane → Chf3 CF4

https://huagongshe.com/reaction/1095207

Reaktionsgleichung

Beteiligte Stoffe

RolleNameHCIDEinwaage
EduktTrifluoromethaneHCID 6373—
EduktCarbon tetrafluorideHCID 6393—
ProduktChf3 CF4HCID 88450547—

Reaktionsschritte

SU8 membranes such as fabricated in Example 1 were inserted into the PlasmaLab 80 machine and treated for 1 to 10 minutes at a CHF3 flow of 20 sccm and an CF4 flow of 20 sccm. The background pressure was 25 mT and the plasma generator power was 300 W. The results of SEM morphology measurements, as well as water contact angle and AFM roughness analysis are shown in FIGS. 12a and 12b, respectively.

Herkunft & Nachweise

DOI10.6084/m9.figshare.5104873.v1
PatentnummerUS08137569B2
Quelldatensatzuspto-grants-2012_03
ORD IDord-237bd32383524a8aa3a3e8229d4feb84
Quellennotizuspto-grants-2012_03