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HuagongsheHuagongshe Chemie-Druckbericht · Nur für Forschungszwecke
HRID 11976Erstellt: 24. Oktober 2026

Tetraethoxysilane → Trifluorovinyl triethoxysilane

https://huagongshe.com/de/reaction/11976

Reaktionsgleichung

Beteiligte Stoffe

RolleNameHCIDEinwaage
EduktTetraethoxysilaneHCID 6517—
EduktChlorotrifluoroethyleneHCID 6594—
EduktCID 53628100HCID 178418400—
LösungsmittelDiethyl EtherHCID 3283—
ProduktTrifluorovinyl triethoxysilaneHCID 21864279—

Reaktionsbedingungen

Temperatur-80 °C

Reaktionsschritte

200 ml of freshly distilled dry Et2O is added to a 500 ml vessel (under an argon atmosphere). The vessel is cooled down to −80° C. and 15 g (0.129 mol) of CF2═CFCl gas is bubbled to Et2O. 100 ml (0.13 mol) of sec-BuLi is added dropwise during three hours. The temperature of the solution is kept below −60° C. all the time. The solution is stirred for 15 minutes and 29 ml (27.08 g, 0.130 mol) of Si(OEt)4 is added in small portions. The solution is stirred for over night allowing it to warm up to room temperature. Formed red solution is filtered and evaporated to dryness to result crude trifluorovinyltriethoxysilane, CF2═CFSi(OEt)3.

Herkunft & Nachweise

DOI10.6084/m9.figshare.5104873.v1
PatentnummerUS07098346B2
Quelldatensatzuspto-grants-2006_08
ORD IDord-5458c1810da14b22b17018798e405eb9
Quellennotizuspto-grants-2006_08