Triethylsilane → HCID 9973488, Verbindung

HRID 1707327Notizen

Reaktionsgleichung

Reaktionsgleichung von HRID 1707327
[CH2:1]([NH:9][C:10](=[O:48])[C@H:11]([C@H:44]([CH2:46][CH3:47])[CH3:45])[NH:12][CH2:13][C@@H:14]([NH:36]C(OC(C)(C)C)=O)[CH2:15][S:16]C(C1C=CC=CC=1)(C1C=CC=CC=1)C1C=CC=CC=1)[CH2:2][C:3]1[CH:8]=[CH:7][CH:6]=[CH:5][CH:4]=1.C([SiH](CC)CC)C>FC(F)(F)C(O)=O.C(Cl)Cl>[CH2:1]([NH:9][C:10](=[O:48])[C@H:11]([C@H:44]([CH2:46][CH3:47])[CH3:45])[NH:12][CH2:13][C@@H:14]([NH2:36])[CH2:15][SH:16])[CH2:2][C:3]1[CH:8]=[CH:7][CH:6]=[CH:5][CH:4]=1

Komponenten

5

Edukt 2

HCID 12052TriethylsilaneHCID 10055192HCID 10055192, Verbindung

Produkt 1

HCID 9973488HCID 9973488, VerbindungAusbeute 44,2 %

Reagenzien, Katalysatoren, Lösungsmittel 2

HCID 6344DichloromethaneLösungsmittelHCID 6422Trifluoroacetic acidLösungsmittel

Versuchsvorschrift

The product of Step D (0.09 g, 0.14 mmol) was dissolved in 4 mL of 25% trifluoroacetic acid (TFA) in CH2Cl2 at ambient temperature, triethylsilane (0.089 mL, 0.56 mmol) was added and the solution was stirred for 3 h. The reaction mixture was concentrated and partitioned between EtOAc and aqueous saturated NaHCO3 solution. The organic layer was washed with brine and dried (Na2SO4). Filtration, concentration and trituration with hexane provided 0.02 g (44%) of the title compound, mp 69°-73° C.

Aufarbeitung

  1. concentrationThe reaction mixture was concentrated
  2. custompartitioned between EtOAc and aqueous saturated NaHCO3 solution
  3. washThe organic layer was washed with brine
  4. dry with materialdried (Na2SO4)
  5. filtrationFiltration, concentration and trituration with hexane

Quellen und Nachweise

ORD-Eintrag
ord-bd09be1ffd1a47eba1795ac91e3524b6
Quelldatensatz
uspto-grants-1994_10
Patentnummer
US05352705

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