Trifluoromethane → HCID 89157714, Verbindung

Beteiligte Stoffe

Reaktionsschritte

A similar procedure to the one reported in EXAMPLE 2 was followed except dichlorodiethylsilane (5.12 g, 32.5 mmol, 1 eq) was used as the substrate along with 2eq each of CF3H and KHMDS to obtain pure diethyl bis(trifluoromethyl)silane 3.2 g, 44% yield. 1H NMR (400 MHz): δ 1.08 (m, CH2), 1.16 (m, CH3); 13C NMR (100.5 MHz): δ-1.10 (s, CH2), 5.55 (s, CH3), 128.6 (qq, 1JC—F=319 Hz, 3.35 Hz, CF3); 19F NMR (376.3 MHz): δ-60.2 (s); 29Si NMR (79.5 MHz): δ-2.43 (sept, 2JSi—F=39.4 Hz, 1 Si).

Herkunft & Nachweise