C1C[O:4]CC1.[C:6]([OH:10])(=[O:9])[CH:7]=[CH2:8].[C:11]([O:15][CH2:16][CH2:17][OH:18])(=[O:14])[CH:12]=[CH2:13].[CH2:19]([C:21]([O:25][C:26](CC)([CH2:28][CH3:29])C)(CC)C)[CH3:20]>C(OCCC)(=O)C=C.CC(N=NC(C#N)(C)C)(C#N)C>[C:6]([OH:10])(=[O:9])[CH:7]=[CH2:8].[C:11]([O:15][CH2:16][CH2:17][OH:18])(=[O:14])[CH:12]=[CH2:13].[C:21]([O:25][CH2:26][CH2:28][CH3:29])(=[O:4])[CH:19]=[CH2:20]To 20 g of THF were added 8 g of acrylic acid, 1.5 g of hydroxyethyl acrylate, 0.1 g of propyl acrylate, and 0.1 g of AIBN. The resulting mixture was reacted at 67° C. for 3 hours. After reaction, the resulting solution was dropped in diethylethyl ether, thereby obtaining 9.7 g of a photoresist polymer of Formula (Vc).
Wird geladen…