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HuagongsheHuagongshe Chemie-Druckbericht · Nur für Forschungszwecke
HRID 972165Erstellt: 26. Oktober 2026

Silica → Ammonia

https://huagongshe.com/reaction/972165

Reaktionsgleichung

Beteiligte Stoffe

RolleNameHCIDEinwaage
EduktSilicaHCID 24261—
EduktTrisilicon tetranitrideHCID 3084099—
ProduktAmmoniaHCID 222—
ProduktSilaneHCID 23953—
ProduktTrisilicon tetranitrideHCID 3084099—

Reaktionsschritte

Next, a middle silicon nitride layer 12 is deposited onto the first layer 10 of silicon dioxide previously deposited. Silicon nitride is produced from the reaction of silane (SiH4) with nitrogen and ammonia (NH3). The nitride deposition is performed, for example, in a "pancake style"]reactor. Typically, 3.5 minutes is required to deposit 500 Angstroms of Si3N4 at 800° C.

Herkunft & Nachweise

DOI10.6084/m9.figshare.5104873.v1
PatentnummerUS04052251
Quelldatensatzuspto-grants-1977_10
ORD IDord-6f007f246b7a4bd4a4b23dffc3c83d94
Quellennotizuspto-grants-1977_10