1660-94-2CCOP(=O)(CP(=O)(OCC)OCC)OCCSTJWVOQLJPNAQL-UHFFFAOYSA-NWarning
H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]
P261, P264, P264+P265, P271, P280, P302+P352, P304+P340, P305+P351+P338, P319, P321, P332+P317, P337+P317, P362+P364, P403+P233, P405, and P501 (click each P-code to see the statement)
Aggregated GHS information provided per 44 reports by companies from 3 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.
UsesTetraethyl methylidenebisphosphonate, can be used in the synthesis of tetrazoloquinoline-based mono- and bisphosphonate esters as potent anti-inflammatory agents. It is also an intermediate for the synthesis of new bisphosphonate and bisphosphonic acid derivatives with anticancer and antischistosomal activity.
UsesReactant for synthesis of: Dual substrate-site inhibitors of 3-deoxy-D-arabino-heptulosonate 7-phosphate synthaseUnnatural alpha-amino acid derivatives containing gem-biphosphonatesBiphenyl sulfonylamino Me bisphosphonic acids as inhibitors of matrix metalloproteinases and bone resorptionLycopene via Wittig-Horner reactionAlkylaminoethylbisphosphinic acids to target farnesyl diphosphate synthaseAromatic bisphosphonates for use as inhibitors of geranylgeranyl diphosphate synthasePrecursor for synthesis of dendritic polyglycerol anions used toward L-selectin inhibition
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1660-94-2DTXSID60937146