Completing data — refresh the page later to see the latest
307531-94-8C=C(C)C(=O)OCCC[Si]12O[Si]3(CC(C)C)O[Si]4(CC(C)C)O[Si](CC(C)C)(O1)O[Si]1(CC(C)C)O[Si](CC(C)C)(O2)O[Si](CC(C)C)(O3)O[Si](CC(C)C)(O4)O1CVYLJMBNVJQTGW-UHFFFAOYSA-N307531-94-8DTXSID90391191Safety information is for reference only and does not replace the supplier’s Safety Data Sheet (SDS), applicable regulations, or professional assessment.
UsesPSS-(1-Propylmethacrylate)-Heptaisobutyl substituted can be used as a functional monomer to prepare molecularly imprinted polymers or hybrid monolithic materials (MIPs) via reversible addition-fragmentation chain transfer polymerization (RAFT) or thermally initiated free radical polymerization reactions using suitable template molecules, cross-linker, porogenic solvent, and initiator. The resulting polymeric materials exhibited excellent polymer properties such as high thermal stability, high mechanical stability, low inflammability surface hardening, and oxidation resistance. These POSS nanostructural polymeric materials are commonly used in various biomedical applications, drug delivery, imaging reagents, catalyst supports, enzyme-like catalysis, solid-phase extraction, sensors, and in the chromatographic stationary phase.
General DescriptionPSS-(1-Propylmethacrylate)-Heptaisobutyl substituted silsesquioxane (POSS) is a polyhedral oligomeric silsesquioxane (POSS) with an inorganic-organic cage-like architecture made up of silicon and oxygen.
No reaction records under the current filter.
Loading…