562-90-3CC(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=OYZVRVDPMGYFCGL-UHFFFAOYSA-N562-90-3DTXSID60889353Safety information is for reference only and does not replace the supplier’s Safety Data Sheet (SDS), applicable regulations, or professional assessment.
Danger
H314 (100%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation]
P260, P264, P280, P301+P330+P331, P302+P361+P354, P304+P340, P305+P354+P338, P316, P321, P363, P405, and P501 (click each P-code to see the statement)
Aggregated GHS information provided per 44 reports by companies from 2 notifications to the ECHA C&L Inventory.
Chemical: Acetic acid, tetraanhydride with silicic acid (H4SiO4)
Silicon tetraacetate: Does not have an individual approval but may be used as a component in a product covered by a group standard. It is not approved for use as a chemical in its own right.
UsesSilicon tetraacetate is used in the preparation of silicon dioxide thin films by a direct photochemical vapor deposition method. It serves as a precursor to prepare silicon complexes with monofunctional bidentate Schiff bases. It is also used as an alternative to silicon hydride and alkoxide for low-temperature silicon dioxide production. Further, it reacts with ethanol in the absence of water to get silica gel and ethyl acetate. In addition, it is employed as a sol-gel precursor.
General DescriptionSilicon tetraacetate is an alternative to silicon hydride and alkoxide for low-temperature SiO2 production. Silicon tetraacetate reacts with ethanol in absence of water to form silica gel and ethyl acetate. Silicon tetraacetate is reported as a sol-gel precursor.
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