1624-01-7CN(C)[Si](N(C)C)(N(C)C)N(C)CSSCVMVQLICADPI-UHFFFAOYSA-N1624-01-7DTXSID5061829Safety information is for reference only and does not replace the supplier’s Safety Data Sheet (SDS), applicable regulations, or professional assessment.
Danger
H225 (32.8%): Highly Flammable liquid and vapor [Danger Flammable liquids]
P210, P231+P232, P233, P240, P241, P242, P243, P260, P261, P264, P270, P271, P280, P301+P317, P301+P330+P331, P302+P352, P302+P361+P354, P303+P361+P353, P304+P340, P305+P354+P338, P316, P317, P321, P330, P362+P364, P363, P370+P378, P402+P404, P403+P233, P403+P235, P405, and P501 (click each P-code to see the statement)
Aggregated GHS information provided per 67 reports by companies from 5 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.
UsesSilicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino) silane and ozone. Aminosilanes mere prepared by methods all essentially similar, and only the 15olation of tetrakis-(dimethylamino)-silane.
No reaction records under the current filter.
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