N,N,N',N',N'',N''-Hexamethylsilanetriamine

HCID 84795
NotesReactions
Substructure searchFind similar structures

Basic information

CAS
15112-89-7
Standard SMILES
CN(C)[SiH](N(C)C)N(C)C
InChIKey
TWVSWDVJBJKDAA-UHFFFAOYSA-N
Molecular formula
C6H19N3Si
Average molar mass
161.32 g/mol
Monoisotopic mass
161.13482414

Names & identifiers

Preferred name
N,N,N',N',N'',N''-Hexamethylsilanetriamine
IUPAC
N-[bis(dimethylamino)silyl]-N-methylmethanamine
English name
Tris(dimethylamino)silane
Molecular formula
C6H19N3Si
Molecular weight
161.32

Names & synonyms

Silanetriamine, N,N,N',N',N'',N''-hexamethyl-RefChem:926433DTXCID601024209239-165-015112-89-7DTXSID00884786N,N,N',N',N'',N''-HexamethylsilanetriamineTris(dimethylamino)silane3DMAS(Me2N)3SiHN-[bis(dimethylamino)silyl]-N-methylmethanamineSCHEMBL35636
Show more names
TDMASDK087LS 1460amino)siL3DMAS : [(CH3)2N]3SiHTris(dimethyamino)silaneTri(dimethylamino)silaneTris(dimethylamido)silane
TWVSWDVJBJKDAA-UHFFFAOYSA-NNS00052589F87140Tris(dimethylamino)silane, electronic grade, 99.999%Tris(dimethylamino)silane, packaged for use in deposition systemsN,N,N inverted exclamation marka,N inverted exclamation marka,N inverted exclamation marka inverted exclamation marka,N inverted exclamation marka inverted exclamation marka-Hexamethylsilanetriamine

Database identifiers

CAS
15112-89-7
PubChem CID
84795
DTXSID
DTXSID00884786
EC Number
239-165-0

Properties

Computed structural properties

Topological polar surface area
9.7 Ų
Hydrogen bond donors
0
Hydrogen bond acceptors
3
Rotatable bonds
3
Heavy atoms
10

Physicochemical properties

Melting point
0 °C · <0°C
Boiling point
145 °C · 145 °C
Density
0 · 0,838 g/cm3
refractive index
1.4247 · 1.4247
Flash point
25 °C · 25°C
storage temp.
2 · 2-8°C, protect from light

Safety & regulation

GHS classification

GHS Classification · 5 items

This chemical does not meet GHS hazard criteria for 5.8% (4 of 69) of reports.

Danger

H225 (56.5%): Highly Flammable liquid and vapor [Danger Flammable liquids]

P210, P223, P231+P232, P233, P240, P241, P242, P243, P260, P261, P262, P264, P270, P271, P280, P284, P301+P317, P301+P330+P331, P302+P335+P334, P302+P352, P302+P361+P354, P303+P361+P353, P304+P340, P305+P354+P338, P316, P320, P321, P330, P361+P364, P363, P370+P378, P402+P404, P403+P233, P403+P235, P405, and P501 (click each P-code to see the statement)

Aggregated GHS information provided per 69 reports by companies from 7 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.

Hazard information

Regulatory InformationStatus: Active Update: 15-09-2022 https://echa.europa.eu/registration-dossier/-/registered-dossier/34209
Hazard Classes and CategoriesFlam. Liq. 2 (56.5%)

Safety data

wgk
3
tsca
TSCA listed
rtecs
VV5800000
ridadr
1993
Toxicity
rabbit,LD50,skin,477mg/kg (477mg/kg),LIVER: OTHER CHANGESLUNGS, THORAX, OR RESPIRATION: CHRONIC PULMONARY EDEMA,Toxicology and Industrial Health. Vol. 5, Pg. 45, 1989.
risk_code
10-36/37/38-52/53-34-29-20-15-11

Chemistry & industry

Uses & manufacturing

General Manufacturing InformationSilanetriamine, N,N,N',N',N'',N''-hexamethyl-: ACTIVE
Applications · 2 items

UsesTris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.

General DescriptionPlease inquire for quantity, pricing, and packaging options.

Suppliers70 total

上海源象化学有限公司17312431727 · [email protected]
湖北万得化工有限公司15377098680 15377098680 · [email protected]
上海麦克林生化科技股份有限公司021-50706066 15221275939 · [email protected]
温州共赢化学有限公司+86-0086-577-64498589 +86-15355981851 · [email protected]
Henan Rane Chemical Co., Ltd.+86-18738066252 · [email protected]

Related reactions

4 records
New reaction record

Compound notes

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