CAS 177080-67-0 2-Methyl-2-adamantyl methacrylate (HCID 9837566)

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Basic information

CAS: 177080-67-0
Standard SMILES: C=C(C)C(=O)OC1(C)C2CC3CC(C2)CC1C3
InChIKey: FDYDISGSYGFRJM-UHFFFAOYSA-N
Molecular formula: C15H22O2
Average molar mass: 234.33 g/mol
Monoisotopic mass: 234.16197994

Names & identifiers

Preferred name: 2-Methyl-2-adamantyl methacrylate
IUPAC: (2-methyl-2-adamantyl) 2-methylprop-2-enoate
English name: 2-Methacryloyloxy-2-methyladamantane
Molecular formula: C15H22O2
Molecular weight: 234.33

Names & synonyms

177080-67-02-METHYL-2-ADAMANTYL METHACRYLATE2-Methacryloyloxy-2-methyladamantaneDTXSID00431592RefChem:475152DTXCID90382423805-868-12-Methyladamantan-2-yl methacrylate2-Methyl-2-adamantylmethacrylate(2-methyl-2-adamantyl) 2-methylprop-2-enoate2-Methyl-acrylic acid 2-methyl-adamantan-2-yl ester2-METHYLADAMANTAN-2-YL 2-METHYLPROP-2-ENOATE

Show more names

MADMA MAMA2-METHYL-2-ADAMANTYL METHACRYL-Methyl-2-adamantylmethacrylate2-Ethy1-2-adamantylmethacrylate2-Methyl-2-adaMantyl Methacrylte2-Methyl-2-adamantanyl methacrylate2-Methyl-2-adamantyl methacrylate (MADMA)

MFCD041143542-methacryloyloxy-2-methyladamantane (stabilized with mehq)2-Propenoic acid, 2-methyl-, 2-methyltricyclo[3.3.1.13,7]dec-2-yl ester2-Methacryloyloxy-2-methyladamantane(stabilizedwithMEHQ)Methacrylic Acid 2-Methyl-2-adamantyl EsterSCHEMBL44331SCHEMBL19587032-Methyladamantan-2-ylmethacrylate

Database identifiers

Properties

Computed structural properties

XLogP: 3.7
Topological polar surface area: 26.3 Å²
Hydrogen bond donors: 0
Hydrogen bond acceptors: 2
Rotatable bonds: 3
Heavy atoms: 17
Formal charge: 0
Complexity: 341

Physicochemical properties

Boiling point: 301.3 · 301.3±11.0 °C(Predicted)
Density: 1.06 · 1.06±0.1 g/cm3(Predicted)
refractive index: 1.505 to · 1.5050 to 1.5090
Flash point: 120 °C · 120°C(lit.)
storage temp.: 2 · 2-8°C
form: clear liquid
color: Colorless to Almost colorless
Specific Gravity: 1.06 · 1.06
Sensitive: Heat Sensitive
InChI: InChI=1S/C15H22O2/c1-9(2)14(16)17-15(3)12-5-10-4-11(7-12)8-13(15)6-10/h10-13H,1,4-8H2,2-3H3
InChIKey: FDYDISGSYGFRJM-UHFFFAOYSA-N
SMILES: C(OC1(C)C2CC3CC1CC(C3)C2)(=O)C(C)=C
Symbol(GHS): 7 · GHS07
Signal word: Warning
Hazard statements: 315 · H315-H319
Precautionary statements

Safety & regulation

GHS classification

GHS Classification · 4 items

Warning

H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]

P264, P264+P265, P280, P302+P352, P305+P351+P338, P321, P332+P317, P337+P317, and P362+P364 (click each P-code to see the statement)

The GHS information provided by 1 company from 1 notification to the ECHA C&L Inventory.

Hazard information

Hazard Classes and CategoriesSkin Irrit. 2 (100%)

Safety data

hs_code: 2902190000
Signal word: Warning
Symbol(GHS): GHS07
Hazard statements: H315-H319
Precautionary statements: P305+P351+P338

Chemistry & industry

Applications · 3 items

Description2-Methyl-2-adamantylmethacrylate (2-Methacryloyloxy-2-methyladamantane) is an aliphatic hydrocarbon with a trifluoromethyl group. It is a monomer that can be used to make polymers. 2-Methyl-2-adamantylmethacrylate has been shown to polymerize rapidly and form high molecular weight polymers. It reacts with hydroxyl groups to form ester linkages. This molecule also has the ability to self assemble, making it a supramolecular material. Impurities may affect the polymerization kinetics of this molecule and must be removed before use. As this compound is hydrophobic, it can only be patterned using a sublimable process.

Uses2-Methyl-2-adamantylmethacrylate can be used to prepare Analog Semiconductors, Light-Emitting Diodes LED, Solar Photovoltaics PV.

General DescriptionThree different methacrylic monomers (g-butyrolactone methacrylate (GBLMA), 3-hydroxyl-1-adamantyl methacrylate (HAMA), and 2-methyl-2- adamantyl methacrylate (MAMA)) are the most often terpolymerized for 193 nm photoresists. The lactone group of GBLMA plays a vital role in the etching rate, facilitating binding to the substrate. The hydroxyl group of HAMA aids in the solubility and stability of the polymer. MAMA is particularly sensitive to 193 nm light and improves the etching resolution (chemical amplification)[1].