酸化ガリウム(Ⅲ)

用途高純度金属酸化物。

説明Gallium(III) oxide (Ga2O3) is a wide band gap semiconductor that belongs to a family of transparent semiconducting oxides (TSO). It can form different polymorphs such as α-,β-, γ-, δ-, and ε-. Polycrystalline and nanocrystalline Ga2O3 can be prepared using several methods such as chemical vapor deposition, thermal vaporization, and sublimation, molecular beam epitaxy, melt growth, etc. It is widely used as a functional material in various applications including optoelectronics, chemical sensors, catalysis, semiconductor devices, field-effect transistors, and many others.

使用In semiconductors; gas sensing; catalysis. Nanostructures as blue and UV light emitters in optoelectronic device applications. Gallium(III) oxide has been reported in applications in lasers, phosphors, and luminescent materials. Monoclinic ß-Ga2O3 is used in gas sensors and luminescent phosphors and can be applied to dielectric coatings for solar cells. This stable oxide has also shown potential for deep-ultraviolet transparent conductive oxides, and transistor applications. Thin Ga2O3 films are of commercial interest as gas sensitive materials. ß-Gallium(III) oxide is used in the production of Ga2O3-Al2O3 catalyst.

一般的な説明Odorless fine white powder. Insoluble in water.

使用用途酸化ガリウムは、これまでの照明器具に使われていた蛍光灯や電球にとって代わりつつあるLED (英: Light-Emitting Diode: 発光ダイオード) に使用する基板の原料以外にも、緑色の蛍光体の原料として用いられています。 そのほか、酸化ガリウムを使ったパワー半導体素子 (電力変換用スイッチング素子など) は、従来、使用されていた炭化ケイ素からなる半導体チップと比較して、導通時の抵抗が小さいことから小型化かつ低損失化が図れると期待されています。