N,N,N',N',N'',N''-Hexamethylsilanetriamine (HCID 84795)

名称と識別子

優先名称: N,N,N',N',N'',N''-Hexamethylsilanetriamine
IUPAC: N-[bis(dimethylamino)silyl]-N-methylmethanamine
現地名: N,N,N',N',N'',N''-ヘキサメチルシラントリアミン
英語名: Tris(dimethylamino)silane
分子式: C6H19N3Si
分子量: 161.32

名称と別名

Silanetriamine, N,N,N',N',N'',N''-hexamethyl-RefChem:926433DTXCID601024209239-165-015112-89-7DTXSID00884786N,N,N',N',N'',N''-HexamethylsilanetriamineTris(dimethylamino)silane3DMAS(Me2N)3SiHN-[bis(dimethylamino)silyl]-N-methylmethanamineSCHEMBL35636

名称をさらに表示

N,N',N''-シラントリイルトリス(ジメチルアミン)N,N,N',N',N'',N''-ヘキサメチルシラントリイルトリアミントリス(ジメチルアミノ)シランN,N,N',N',N'',N''-ヘキサメチルシラントリアミンN,N',N''-(シラントリイル)トリス(ジメチルアミン)N，N，N’，N’，N’’，N’’-ヘキサメチルシラントリアミンTRIS(DIMETHYLAMINO)SILANE, 99+%, 3DMAS (99.999%-SI) PURATREM, 14-8750, CONTAINED IN 50 ML SWAGELOK® CYLINDER (96-1070) FOR CVD/ALDトリス(ジメチルアミノ)シラン, 99+%, 3DMAS (99.999%-Si) PURATREMトリス(ジメチルアミノ)シラン, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALDN,N,N′,N′,N′′,N′′-ヘキサメチルシラントリイルトリアミンN,N,N′,N′,N′′,N′′-ヘキサメチルシラントリアミンN,N′,N′′-(シラントリイル)トリス(ジメチルアミン)N,N′,N′′-シラントリイルトリス(ジメチルアミン)[ビス(ジメチルアミノ)シリル]ジメチルアミンTDMASDK087LS 1460amino)siL3DMAS : [(CH3)2N]3SiHTris(dimethyamino)silaneTri(dimethylamino)silaneTris(dimethylamido)silane

TWVSWDVJBJKDAA-UHFFFAOYSA-NNS00052589F87140Tris(dimethylamino)silane, electronic grade, 99.999%Tris(dimethylamino)silane, packaged for use in deposition systemsN,N,N inverted exclamation marka,N inverted exclamation marka,N inverted exclamation marka inverted exclamation marka,N inverted exclamation marka inverted exclamation marka-Hexamethylsilanetriamine

データベース識別子

CAS: 15112-89-7
PubChem CID: 84795
DTXSID: DTXSID00884786
EC Number: 239-165-0

物性

構造計算による物性

極性表面積: 9.7 Å²
水素結合供与体数: 0
水素結合受容体数: 3
回転可能結合数: 3
重原子数: 10
形式電荷: 0
複雑度: 74

物理化学的性質

融点: 0 °C · <0°C
沸点: 145 °C · 145 °C
比重(密度): 0 · 0,838 g/cm3
屈折率: 1.4247 · 1.4247
闪点: 25 °C · 25°C
貯蔵温度: 2 · 2-8°C, protect from light
酸解離定数(Pka): 10.93 · 10.93±0.70(Predicted)
外見: 液体
色: 無色～淡黄色
比重: 0.84 · 0.84
InChI: 1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3
InChIKey: TWVSWDVJBJKDAA-UHFFFAOYSA-N
SMILES: CN(C)[SiH](N(C)C)N(C)C
EPAの化学物質情報: N,N,N',N',N'',N''-Hexamethylsilanetriamine (15112-89-7)

安全と法規制

GHS分類

GHS Classification · 5 件

This chemical does not meet GHS hazard criteria for 5.8% (4 of 69) of reports.

Danger

H225 (56.5%): Highly Flammable liquid and vapor [Danger Flammable liquids]

P210, P223, P231+P232, P233, P240, P241, P242, P243, P260, P261, P262, P264, P270, P271, P280, P284, P301+P317, P301+P330+P331, P302+P335+P334, P302+P352, P302+P361+P354, P303+P361+P353, P304+P340, P305+P354+P338, P316, P320, P321, P330, P361+P364, P363, P370+P378, P402+P404, P403+P233, P403+P235, P405, and P501 (click each P-code to see the statement)

Aggregated GHS information provided per 69 reports by companies from 7 notifications to the ECHA C&L Inventory. Each notification may be associated with multiple companies.

危険有害性情報

Regulatory InformationStatus: Active Update: 15-09-2022 https://echa.europa.eu/registration-dossier/-/registered-dossier/34209

Hazard Classes and CategoriesFlam. Liq. 2 (56.5%)

安全データ

wgk: 3
tsca: TSCA listed
rtecs: VV5800000
ridadr: 1993
毒性: rabbit,LD50,skin,477mg/kg (477mg/kg),LIVER: OTHER CHANGESLUNGS, THORAX, OR RESPIRATION: CHRONIC PULMONARY EDEMA,Toxicology and Industrial Health. Vol. 5, Pg. 45, 1989.
risk_code: 10-36/37/38-52/53-34-29-20-15-11
化審法: 新規公示化学物質（2011年3月31日以前届出）
hazard_code: F,C
safety_code: 16-26-36/37/39-45-43
Hazard Classifications: Acute Tox. 3 DermalAcute Tox. 3 InhalationAcute Tox. 4 OralEye Dam. 1Flam. Liq. 2Skin Corr. 1BWater-react 2
ストレージクラス: 4.3 - Hazardous materials which set free flammable gases upon contact with water

化学と産業

用途と製造

General Manufacturing InformationSilanetriamine, N,N,N',N',N'',N''-hexamethyl-: ACTIVE

応用分野 · 2 件

使用Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.

一般的な説明Please inquire for quantity, pricing, and packaging options.

サプライヤー50 社

上海源象化学有限公司17312431727 · [email protected]

湖北万得化工有限公司15377098680 15377098680 · [email protected]

上海麦克林生化科技股份有限公司021-50706066 15221275939 · [email protected]

温州共赢化学有限公司+86-0086-577-64498589 +86-15355981851 · [email protected]

Henan Rane Chemical Co., Ltd.+86-18738066252 · [email protected]

N,N,N',N',N'',N''-ヘキサメチルシラントリアミン

基本情報