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Pivalic anhydride → 3-(3-Hydroxy-4-methoxyphenyl)prop-2-enal

HRID 1007621
ノート
印刷プレビュー

反応式

HRID 1007621 の反応式
[OH:1][C:2]1[CH:3]=[C:4]([CH:10]=[CH:11][C:12]=1[O:13][CH3:14])[CH:5]=[CH:6][C:7](O)=[O:8].C(OC(=O)C(C)(C)C)(=O)C(C)(C)C.[H][H]>C([O-])(=O)C.[Pd+2].C([O-])(=O)C.C1(C)C=CC(P(C2C=CC(C)=CC=2)C2C=CC(C)=CC=2)=CC=1>[OH:1][C:2]1[CH:3]=[C:4]([CH:10]=[CH:11][C:12]=1[O:13][CH3:14])[CH:5]=[CH:6][CH:7]=[O:8]
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

6

反応物 3

HCID 15234Pivalic anhydrideHCID 921263-(3-Hydroxy-4-methoxyphenyl)prop-2-enoic acidHCID 178418361HCID 178418361、化合物2 回

生成物 1

HCID 540251573-(3-Hydroxy-4-methoxyphenyl)prop-2-enal収率 49.4%

試薬・触媒・溶媒 2

HCID 13956Phosphine, tris(4-methylphenyl)-触媒
HCID 167845
palladium(II) acetate
触媒

反応条件

温度
80 °C

実験手順

Palladium acetate (58 mg, 0.257 mmol), tri(p-tolyl) phosphine (157 mg, 0.515 mmol), 3-hydroxy-4-methoxycinnamic acid (5.00 g, 25.7 mmol) and pivalic acid anhydride (14.4 g, 77.2 mmol) were added thereto, and thereafter the mixture was bubbled with nitrogen gas for 30 minutes to substitute nitrogen gas completely for the gas in the system of reaction, whereby the system was filled with nitrogen gas. Next, hydrogen gas was added thereinto to substitute hydrogen gas for the gas in the system, and then the mixture was stirred under hydrogen pressure of 3.4 MPa at 80° C. for 24 hours for reaction. Thus obtained reaction solution was concentrated under reduced pressure to remove tetrahydrofuran by vaporization. The remaining residue was subjected to a purification process with a silica gel column chromatography (eluting solvent: toluene/ethyl acetate=4/1) to obtain 3-hydroxy-4-methoxycinnamaldehyde (2.26 g, 12.7 mmol, yield: 49%).

後処理

  1. customthe mixture was bubbled with nitrogen gas for 30 minutes
  2. customin the system of reaction, whereby the system
  3. additionwas filled with nitrogen gas
  4. customfor reaction
  5. customThus obtained reaction solution
  6. concentrationwas concentrated under reduced pressure
  7. customto remove tetrahydrofuran by vaporization
  8. washThe remaining residue was subjected to a purification process with a silica gel column chromatography (eluting solvent: toluene/ethyl acetate=4/1)

出典と根拠

ORDレコード
ord-5fbb8291ec95476a9ec895955de679cc
出典データセット
uspto-grants-2004_09
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US06794531B2

反応ノート

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