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Dimethylformamide → N-{2,4-Dimethyl-5-[6-(pyridin-3-yl)-1H-imidazo[1,2-b]pyrazol-1-yl]phenyl}-3-[(2-methoxy-ethoxy)methyl]-5-(pentafluoro-lambda6-sulphanyl)benzamide

HRID 1055763
ノート
印刷プレビュー

反応式

HRID 1055763 の反応式
[CH3:1][O:2][CH2:3][CH2:4][O:5][CH2:6][C:7]1[CH:8]=[C:9]([CH:13]=[C:14]([S:16]([F:21])([F:20])([F:19])([F:18])[F:17])[CH:15]=1)C(O)=O.CN(C(ON1N=NC2C=CC=NC1=2)=[N+](C)C)C.F[P-](F)(F)(F)(F)F.C[C:47]1[C:53]([N:54]2[C:61]3[N:57]([N:58]=[C:59]([C:62]4[CH:63]=[N:64][CH:65]=[CH:66][CH:67]=4)[CH:60]=3)[CH:56]=[CH:55]2)=[C:52]([CH3:68])[CH:51]=[CH:50][C:48]=1N.[CH3:69][N:70]([CH:72]=[O:73])C>>[CH3:48][C:50]1[CH:51]=[C:52]([CH3:68])[C:53]([N:54]2[C:61]3[N:57]([N:58]=[C:59]([C:62]4[CH:63]=[N:64][CH:65]=[CH:66][CH:67]=4)[CH:60]=3)[CH:56]=[CH:55]2)=[CH:47][C:69]=1[NH:70][C:72](=[O:73])[C:9]1[CH:13]=[C:14]([S:16]([F:21])([F:17])([F:19])([F:18])[F:20])[CH:15]=[C:7]([CH2:6][O:5][CH2:4][CH2:3][O:2][CH3:1])[CH:8]=1
参加物実験手順後処理出典と根拠反応ノート

参加物

5

反応物 4

HCID 6228DimethylformamideHCID 9886157Methanaminium, N-((dimethylamino)(3H-1,2,3-triazolo(4,5-b)pyridin-3-yloxy)methylene)-N-methyl-, hexafluorophosphate(1-) (1:1)HCID 896996673-[(2-Methoxyethoxy)methyl]-5-(pentafluoro-lambda6-sulphanyl)benzoic acidHCID 89699939HCID 89699939、化合物

生成物 1

HCID 71667404
N-{2,4-Dimethyl-5-[6-(pyridin-3-yl)-1H-imidazo[1,2-b]pyrazol-1-yl]phenyl}-3-[(2-methoxy-ethoxy)methyl]-5-(pentafluoro-lambda6-sulphanyl)benzamide

実験手順

58 mg (0.173 mmol) of the compound of Example 98A and 75 mg (0.198 mmol) of HATU were dissolved in 1 ml of DMF, and 24 mg (0.198 mmol) of 4-N,N-dimethylaminopyridine (DMAP) were added slowly. 50 mg (0.165 mmol) of the compound of Example 11A were then added. The reaction mixture was stirred at RT for about 16 h and then separated into its components by preparative HPLC (Method 36). Pooling of the product fractions, evaporation and drying of the residue under high vacuum gave 76 mg (75% of theory) of the title compound.

後処理

  1. customseparated into its components by preparative HPLC (Method 36)
  2. customPooling of the product fractions, evaporation
  3. customdrying of the residue under high vacuum

出典と根拠

ORDレコード
ord-965cf988baa345b2bb41fa2a34eaa54d
出典データセット
uspto-grants-2016_07
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US09394309B2

反応ノート

読み込み中…

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