Trifluoromethane → Chf3 CF4

HRID 1095207

反応式

HRID 1095207 の反応式
[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]>>[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]

参加物

3

実験手順

SU8 membranes such as fabricated in Example 1 were inserted into the PlasmaLab 80 machine and treated for 1 to 10 minutes at a CHF3 flow of 20 sccm and an CF4 flow of 20 sccm. The background pressure was 25 mT and the plasma generator power was 300 W. The results of SEM morphology measurements, as well as water contact angle and AFM roughness analysis are shown in FIGS. 12a and 12b, respectively.

後処理

  1. customThe results of SEM morphology measurements

出典と根拠

ORDレコード
ord-237bd32383524a8aa3a3e8229d4feb84
出典データセット
uspto-grants-2012_03
特許番号
US08137569B2

関連ノート

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