Trifluoromethane → Chf3 CF4
反応式
[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]>>[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]参加物
3
実験手順
SU8 membranes such as fabricated in Example 1 were inserted into the PlasmaLab 80 machine and treated for 1 to 10 minutes at a CHF3 flow of 20 sccm and an CF4 flow of 20 sccm. The background pressure was 25 mT and the plasma generator power was 300 W. The results of SEM morphology measurements, as well as water contact angle and AFM roughness analysis are shown in FIGS. 12a and 12b, respectively.
後処理
- customThe results of SEM morphology measurements
出典と根拠
- ORDレコード
- ord-237bd32383524a8aa3a3e8229d4feb84
- 出典データセット
- uspto-grants-2012_03
- 特許番号
- US08137569B2
反応ノート
読み込み中…