Trifluoromethane → Chf3 CF4

HRID 1182631

反応式

HRID 1182631 の反応式
[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]>>[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]

参加物

3

実験手順

SU8 membranes such as fabricated in Example 1 were inserted into the PlasmaLab 80 machine and treated for 1 to 10 minutes at a CHF3 flow of 20 sccm and an CF4 flow of 20 sccm. The background pressure was 25 mT and the plasma generator power was 300 W. The results of SEM morphology measurements, as well as water contact angle and AFM roughness analysis are shown in FIGS. 12a and 12b, respectively.

後処理

  1. customThe results of SEM morphology measurements

出典と根拠

ORDレコード
ord-dd074aa4a37c4a6086acf39dc3df8ccf
出典データセット
uspto-grants-2014_03
特許番号
US08663780B2

関連ノート

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