Hydrochloric Acid → 8-methoxy-3-methyl-2,3-dihydro-1H-3-benzazepin-2-one

HRID 130800ノート

反応式

HRID 130800 の反応式
Cl.CO[CH:4](OC)[CH2:5][N:6]([CH3:18])[C:7](=[O:17])[CH2:8][C:9]1[CH:14]=[CH:13][CH:12]=[C:11]([O:15][CH3:16])[CH:10]=1>CC(O)=O.ClCCl>[CH3:16][O:15][C:11]1[CH:12]=[CH:13][C:14]2[CH:4]=[CH:5][N:6]([CH3:18])[C:7](=[O:17])[CH2:8][C:9]=2[CH:10]=1

参加物

5

反応物 2

HCID 313Hydrochloric AcidHCID 59730089N-(2,2-dimethoxyethyl)-2-(3-methoxyphenyl)-N-methylacetamide

生成物 1

HCID 597302948-methoxy-3-methyl-2,3-dihydro-1H-3-benzazepin-2-one収率 84%

試薬・触媒・溶媒 2

HCID 176Acetic Acid溶媒HCID 6344Dichloromethane溶媒

実験手順

Add concentrated HCl (3.5 L) to a solution of N-(2,2-dimethoxyethyl)-2-(3-methoxyphenyl)-N-methylacetamide (790 g, 2.709 mol, 1.0 eq) dissolved in HOAc (3.5 L). Stir the mixture for 16 hours at room temperature. Dilute the reaction mixture with 4 L of dichloromethane and then quench slowly with 50% NaOH (4.0 L) over 2 hours. Separate the two layers. Collect the organic layer, dry over sodium sulfate and concentrate under vacuum to yield an off-white solid. The solid is put through a silica plug (1/1 hexanes/ethyl acetate) to obtain the product (Cmpd N, 460 g, 84% yield).

後処理

  1. customquench slowly with 50% NaOH (4.0 L) over 2 hours
  2. customSeparate the two layers
  3. customCollect the organic layer
  4. dry with materialdry over sodium sulfate
  5. concentrationconcentrate under vacuum
  6. customto yield an off-white solid
  7. customto obtain the product (Cmpd N, 460 g, 84% yield)

出典と根拠

ORDレコード
ord-92f8b78365cd4da1b2b07fc3f2606ecb
出典データセット
uspto-grants-2008_06
特許番号
US07381719B2

反応ノート

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