Trifluoroiodoethylene → Trifluorovinyl triethoxysilane

HRID 1349926

反応式

HRID 1349926 の反応式
I[C:2]([F:6])=[C:3]([F:5])[F:4].C([Li])(CC)C.Cl[Si:13]([O:20][CH2:21][CH3:22])([O:17][CH2:18][CH3:19])[O:14][CH2:15][CH3:16]>C(OCC)C>[F:6][C:2]([Si:13]([O:20][CH2:21][CH3:22])([O:17][CH2:18][CH3:19])[O:14][CH2:15][CH3:16])=[C:3]([F:5])[F:4]

参加物

5

反応物 3

HCID 67755TrifluoroiodoethyleneHCID 78398TriethoxychlorosilaneHCID 178418400CID 53628100

生成物 1

HCID 21864279Trifluorovinyl triethoxysilane

試薬・触媒・溶媒 1

HCID 3283Diethyl Ether溶媒

反応条件

温度
-78 °C

実験手順

A dry 3-neck round bottom flask with nitrogen and stir-bar is charged with approximately (9.5 mL, 14.5 g at −78° C., 0.12 mol) iodotrifluoroethylene and 200 mL diethylether pre-cooled to −78° C. Sec-butyl lithium (89 mL, 1.4 M solution, 0.12 mol) is added dropwise over 1 hour. Solution is allowed to stir for 5 minutes at −78° C. Chlorotriethoxysilane (24.35 mL, 0.12 mol) is added over 5 minutes at −78° C. The solution is allowed to warm slowly and allowed to stir overnight. A clear yellow solution remains. Fractional distillation is used to purify the product.

後処理

  1. temperatureto warm slowly
  2. stirringto stir overnight
  3. distillationFractional distillation
  4. customto purify the product

出典と根拠

ORDレコード
ord-31771d6e79344c46809a9b46bb61c434
出典データセット
uspto-grants-2007_05
特許番号
US07214475B2

関連ノート

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