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Hydrochloric Acid → HCID 70632583、化合物

HRID 1579106
ノート
印刷プレビュー

反応式

HRID 1579106 の反応式
N([O-])=O.[Na+].N[CH:6]1[CH:12]([CH2:13][C:14]([C:16]2[CH:21]=[CH:20][CH:19]=[CH:18][CH:17]=2)=[O:15])[CH2:11][CH2:10][CH2:9][CH2:8][CH2:7]1.[ClH:22]>O.[Cu]Cl>[Cl:22][CH:6]1[CH:12]([CH2:13][C:14]([C:16]2[CH:21]=[CH:20][CH:19]=[CH:18][CH:17]=2)=[O:15])[CH2:11][CH2:10][CH2:9][CH2:8][CH2:7]1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

6

反応物 3

HCID 313Hydrochloric Acid2 回HCID 23668193Sodium NitriteHCID 70632612HCID 70632612、化合物

生成物 1

HCID 70632583HCID 70632583、化合物

試薬・触媒・溶媒 2

HCID 62652Cuprous chloride触媒HCID 962Water溶媒

反応条件

温度
0 °C

実験手順

A solution of 5 g of sodium nitrite in 20 ml of water is slowly added dropwise at 0°C, whilst stirring, to a solution of 11 g of crude 3-amino-4-cycloheptyl-acetophenone in 70ml of concentrated hydrochloric acid. After completion of the addition the mixture is stirred for a further 30 minutes at 0°C. The reaction solution is then added dropwise at 0 to 5°C, whilst stirring, to a solution of 7 g of freshly prepared copper-(I) chloride in 30 ml of concentrated hydrochloric acid. After completion of the addition, the mixture is stirred for a further hour at room temperature and a further hour at 40 to 50°C. The reaction mixture is now extracted three times with 200 ml of ether at a time. The organic phases are successively washed with water, 2 N sodium hydroxide solution and again with water, dried over sodium sulphate and evaporated in vacuo. Distillation of the evaporation residue in a high vacuum yields crude 3-chloro-4-cycloheptyl-acetophenone in the fraction boiling at about 130°C/0.05 mm Hg.

後処理

  1. additionAfter completion of the addition the mixture
  2. additionThe reaction solution is then added dropwise at 0 to 5°C
  3. additionAfter completion of the addition
  4. stirringthe mixture is stirred for a further hour at room temperature and a further hour at 40 to 50°C
  5. extractionThe reaction mixture is now extracted three times with 200 ml of ether at a time
  6. washThe organic phases are successively washed with water, 2 N sodium hydroxide solution and again with water
  7. dry with materialdried over sodium sulphate
  8. customevaporated in vacuo
  9. distillationDistillation of the evaporation residue in a high vacuum

出典と根拠

ORDレコード
ord-2f4016dcba5548f384681520da4e8dcd
出典データセット
uspto-grants-1976_02
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US03940434

反応ノート

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