Z-Gln-ONp → H-Gln-Thr-Pro-OtBu
反応式
[NH2:1][C@H:2]([C:6]([N:8]1[CH2:19][CH2:18][CH2:17][C@H:9]1[C:10]([O:12][C:13]([CH3:16])([CH3:15])[CH3:14])=[O:11])=[O:7])[C@@H:3]([CH3:5])[OH:4].C1C=CC(COC([NH:30][C@H:31]([C:37](OC2C=CC([N+]([O-])=O)=CC=2)=[O:38])[CH2:32][CH2:33][C:34]([NH2:36])=[O:35])=O)=CC=1>CN(C=O)C>[NH2:30][C@H:31]([C:37]([NH:1][C@H:2]([C:6]([N:8]1[CH2:19][CH2:18][CH2:17][C@H:9]1[C:10]([O:12][C:13]([CH3:15])([CH3:14])[CH3:16])=[O:11])=[O:7])[C@@H:3]([CH3:5])[OH:4])=[O:38])[CH2:32][CH2:33][C:34](=[O:35])[NH2:36]参加物
4
実験手順
1.36 g H-Thr-Pro-OtBu is dissolved in 10 ml DMF, after which 1.93 g Z-Gln-ONp is added and the reaction mixture is stirred for about 20 hours at room temperature. After evaporation of the mixture to dryness, the residue is dissolved in EtOAc and washed consecutively with 5% KHSO4 solution, 5% NaHCO3 solution and a saturated NaCl solution. The solution is then dried over Na2SO4 and filtered, and the filtrate is evaporated to dryness.
後処理
- customAfter evaporation of the mixture to dryness
- dissolutionthe residue is dissolved in EtOAc
- washwashed consecutively with 5% KHSO4 solution, 5% NaHCO3 solution
- dry with materialThe solution is then dried over Na2SO4
- filtrationfiltered
- customthe filtrate is evaporated to dryness
出典と根拠
- ORDレコード
- ord-b22a67e408404ba19122d28e54dd56bc
- 出典データセット
- uspto-grants-1981_06
- 特許番号
- US04271152
反応ノート
読み込み中…