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Propionic Acid → 5-(2-Chlorophenyl)-2-propionylcyclohexane-1,3-dione

HRID 1700454
ノート
印刷プレビュー

反応式

HRID 1700454 の反応式
[Cl:1][C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][C:3]=1[CH:8]1[CH2:13][C:12](=[O:14])[CH2:11][C:10](=[O:15])[CH2:9]1.[C:16](O)(=[O:19])[CH2:17][CH3:18].CN(C1C=CC=CN=1)C.C1(N=C=NC2CCCCC2)CCCCC1>CN(C)C=O>[Cl:1][C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][C:3]=1[CH:8]1[CH2:13][C:12](=[O:14])[CH:11]([C:16](=[O:19])[CH2:17][CH3:18])[C:10](=[O:15])[CH2:9]1
参加物実験手順後処理出典と根拠反応ノート

参加物

6

反応物 4

HCID 1032Propionic AcidHCID 10868DicyclohexylcarbodiimideHCID 218852-DimethylaminopyridineHCID 8753605-(2-Chlorophenyl)cyclohexane-1,3-dione

生成物 1

HCID 183176705-(2-Chlorophenyl)-2-propionylcyclohexane-1,3-dione収率 53.5%

試薬・触媒・溶媒 1

HCID 6228
Dimethylformamide
溶媒

実験手順

To a solution of 5-(2-chlorophenyl)cyclohexane-1,3-dione (1.0 g), propionic acid (0.60 g) and dimethylaminopyridine (0.82 g) in dimethylformamide (30 ml) was added dicyclohexylcarbodiimide (1.2 g), and the mixture was stirred at room temperature for 13 hours. Under reduced pressure, the solvent was evaporated, and to the residue was ethyl acetate. The mixture was washed with 1N hydrochloric acid and water, and to the mixture was added 1N sodium hydroxide solution. The aqueous layer was washed with diethylether, neutralized with 1N hydrochloric acid and extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried with magnesium sulfate and concentrated under reduced pressure, and the residue was recrystallized from diisopropylether and hexane to give colorless crystals of 5-(2-chlorophenyl)-2-propionylcyclohexane-1,3-dione (0.67 g).

後処理

  1. customUnder reduced pressure, the solvent was evaporated
  2. washThe mixture was washed with 1N hydrochloric acid and water
  3. additionto the mixture was added 1N sodium hydroxide solution
  4. washThe aqueous layer was washed with diethylether
  5. extractionextracted with ethyl acetate
  6. washThe organic layer was washed with water and saturated brine
  7. dry with materialdried with magnesium sulfate
  8. concentrationconcentrated under reduced pressure
  9. customthe residue was recrystallized from diisopropylether and hexane

出典と根拠

ORDレコード
ord-dcf274fda05c4686b3d31807e16cdb72
出典データセット
uspto-grants-2002_02
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US06350749B1

反応ノート

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