反応式
[O-2:1].[In+3:2].[O-2].[O-2].[In+3].[O-2].[Sm+3:7].[O-2].[O-2].[Sm+3]>>[O-2:1].[In+3:2].[O-2:1].[O-2:1].[In+3:2].[O-2:1].[Sm+3:7].[O-2:1].[O-2:1].[Sm+3:7]参加物
3
実験手順
Except that a spattering target containing indium oxide and samarium oxide (molar ratio of In:Sm=90:10) was used, indium oxide-samarium oxide (ISmO) thin films were formed in the same manner as in Example 1-1 and Comparative 1-1. [Evaluation of ISmO thin films of Example 1-9 and Comparative 1-9]
出典と根拠
- ORDレコード
- ord-97421e3459194d7186a29194cf399963
- 出典データセット
- uspto-grants-2016_02
- 特許番号
- US09249032B2
関連ノート
読み込み中…