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HRID 1797261作成日:2026年10月25日

Imidazole → HCID 22176416、化合物

https://huagongshe.com/reaction/1797261

反応式

関与物質

役割名称HCID仕込み量
反応物ImidazoleHCID 795—
反応物IodineHCID 807—
反応物TriphenylphosphineHCID 11776—
反応物DiisopropylethylamineHCID 81531—
反応物4-(4-Fluorophenoxy)piperidineHCID 3734896—
反応物Sodium triacetoxyborohydrideHCID 5049666—
反応物Methanaminium, N-((dimethylamino)(3H-1,2,3-triazolo(4,5-b)pyridin-3-yloxy)methylene)-N-methyl-, hexafluorophosphate(1-) (1:1)HCID 9886157—
反応物(E)-3-(5-cyano-2-methoxy-phenyl)-acrylic acidHCID 11458357—
反応物2-Amino-3-(tert-butoxy)propan-1-olHCID 22176429—
溶媒DimethylformamideHCID 6228—
溶媒acetic acid N,N-dimethylformamideHCID 21926011—
生成物HCID 22176416HCID 22176416—

反応条件

温度20 °C

反応手順

To a suspension of 2-(formyl-3-methoxyphenoxy)ethyl polystyrene (AMEBA) resin (ex Novabiochem) (2.13 g, 3.40 mmol) in a mixture of acetic acid/DMF (60 ml, 1:100 v/v) is added 2-amino-3-tert-butoxy-propan-1-ol and sodium triacetoxyborohydride (1.44 g, 6.80 mmol) and the mixture is shaken for 18 hours at 20° C., then filtered. The resin obtained is washed with methanol, DMF and dichloromethane (DCM), then dried under vacuum. A THF/acetonitrile mixture (20 ml, 1:1 v/v) is added to the dried resin followed by iodine (4.30 g, 18.85 mmol), imidazole (1.16 g, 17.00 mmol) and triphenylphosphine (4.46 g, 17.00 mmol). The suspension obtained is shaken for 6 hours at 20° C., then filtered. The resin is washed with THF and dried under vacuum. To the freshly prepared resin obtained (0.30 g, 0.48 mmol) is added a solution of 4-(4-fluoro-phenoxy)-piperidine (309 mg, 1.00 mmol) dissolved in DMF (2 ml) and diisopropylethylamine (62.4 mg, 0.48 mmol). The mixture is heated at 55° C. for 8 hours. The resulting mixture is filtered and the resin is washed with DMF. To the washed resin are added (E)-3-(5-cyano-2-methoxy-phenyl)-acrylic acid (0.27 g, 1.05 mmol), O-(7-azabenzotriazol-1-yl)-N,N,N′,N′-tetramethyluroniumhexafluoro-phosphate (547 mg, 1.44 mmol) diisopropylethylamine (186 mg, 1.44 mmol) and DMF (4 ml) and the mixture is shaken at 20° C. for 18 hours, then washed with DMF and methanol, after which it is treated with trifluoroacetic acid/DCM (6 ml, 1:1 v/v) at 20° C. for 1 hour to remove the product from the resin. The resulting mixture is filtered and the filtrate evaporated under vacuum to give the product, [MH]+ 453.9.

情報源と証拠

DOI10.6084/m9.figshare.5104873.v1
特許番号US07034042B2
出典データセットuspto-grants-2006_04
ORD IDord-792f3ba8595d4991a482372e7d1739a4
出典メモuspto-grants-2006_04