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HCID 23347045、化合物 → 1-Propanethiol, 3-(triethoxysilyl)-

HRID 1855940
ノート
印刷プレビュー

反応式

HRID 1855940 の反応式
[CH2:1]([O:3][Si:4]([O:13][CH2:14][CH3:15])([O:10][CH2:11][CH3:12])[CH2:5][CH2:6][C:7](N)=[S:8])[CH3:2].[H][H]>[Co](=S)(=S)=S>[SH:8][CH2:7][CH2:6][CH2:5][Si:4]([O:13][CH2:14][CH3:15])([O:3][CH2:1][CH3:2])[O:10][CH2:11][CH3:12]
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

4

反応物 2

HCID 23347045HCID 23347045、化合物HCID 178418361HCID 178418361、化合物2 回

生成物 1

HCID 846581-Propanethiol, 3-(triethoxysilyl)-収率 59%

試薬・触媒・溶媒 1

HCID 178528020HCID 178528020、化合物触媒

反応条件

温度
200 °C

実験手順

Into a clean, dry 300 cubic centimeter high pressure reactor were added 58 grams (0.23 moles) of beta-triethoxysilylthiopropionamide product (containing 14% beta-cyanoethyltriethoxysilane starting material) and 2.5 weight percent of cobalt trisulfide. The reactor was sealed, pressurized to 1100 psig with hydrogen, and placed in a rocker. The vessel was heated to 200° C. internal temperature and maintained at that temperature for 5 hours with agitation while the pressure increased to a maximum of 1750 psig. The final pressure at elevated temperature was 1500 psig and at ambient temperature was 600 psig (indicating that hydrogen was consumed by the reaction.) This procedure yielded 59% of the desired gamma-mercaptopropyltriethoxysilane.

後処理

  1. customInto a clean, dry 300 cubic centimeter high pressure reactor
  2. customThe reactor was sealed
  3. temperaturemaintained at that temperature for 5 hours with agitation while the pressure
  4. temperatureincreased to a maximum of 1750 psig
  5. customat ambient temperature
  6. customwas consumed by the reaction

出典と根拠

ORDレコード
ord-9cadd62d512f4e84ac66b5bd832a5a32
出典データセット
uspto-grants-1980_08
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US04217294

反応ノート

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このページの内容参加物反応条件実験手順後処理出典と根拠反応ノート