Hydrochloric Acid → Dimethyl(1-octenyl)(2-pyridyl)silane

HRID 1860981

反応式

HRID 1860981 の反応式
C1(P(C2C=CC=CC=2)C2C=CC=CC=2)C=CC=CC=1.[CH:20]#[C:21][CH2:22][CH2:23][CH2:24][CH2:25][CH2:26][CH3:27].[CH3:28][SiH:29]([CH3:36])[C:30]1[CH:35]=[CH:34][CH:33]=[CH:32][N:31]=1.Cl>C(OCC)C>[CH3:28][Si:29]([CH3:36])([CH:20]=[CH:21][CH2:22][CH2:23][CH2:24][CH2:25][CH2:26][CH3:27])[C:30]1[CH:35]=[CH:34][CH:33]=[CH:32][N:31]=1

参加物

6

反応条件

温度
40 °C

実験手順

To 1.0 ml of diethyl ether were added 10 mg (0.25 μmol) of bis(cyclooctadiene)platinum, 13 mg (0.50 μmol) of triphenylphosphine and 165 mg (1.5 mmol) of 1-octyne, and 69 mg (0.5 mmol) of dimethyl(2-pyridyl)silane was added dropwise thereto at room temperature over 1 hour. Further, the mixture was continued to be stirred for 6 hours at an inner temperature of 40° C., followed by the addition of 6 ml of 1N hydrochloric acid and 5 ml of diethyl ether. After the mixture was stirred for 30 minutes, it was left stand and separated into the organic and aqueous layers. The organic layer was extracted with five portions of 6 ml of 1N hydrochloric acid, and the resulting aqueous layers were combined together and turned basic with the addition of sodium hydroxide pellets. This aqueous layer was extracted with three portions of 10 ml of diethyl ether. The resulting organic layer was dried over magnesium sulfate and the solvent was evaporated off under reduced pressure to give 112 mg of dimethyl(1-octenyl)(2-pyridyl)silane. Yield: 90%

後処理

  1. additionwas added dropwise
  2. stirringAfter the mixture was stirred for 30 minutes
  3. waitit was left stand
  4. customseparated into the organic and aqueous layers
  5. extractionThe organic layer was extracted with five portions of 6 ml of 1N hydrochloric acid
  6. additionturned basic with the addition of sodium hydroxide pellets
  7. extractionThis aqueous layer was extracted with three portions of 10 ml of diethyl ether
  8. dry with materialThe resulting organic layer was dried over magnesium sulfate
  9. customthe solvent was evaporated off under reduced pressure

出典と根拠

ORDレコード
ord-97440b84bd7f482ea5d3857fe985a647
出典データセット
uspto-grants-2003_03
特許番号
US06531602B2

関連ノート

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