Methanol → HCID 54335129、化合物

HRID 1934496ノート

反応式

HRID 1934496 の反応式
O[CH2:2][C:3]([C:5]1[CH:10]=[CH:9][CH:8]=[CH:7][CH:6]=1)=[O:4].[F:11][C:12]1[CH:13]=[C:14]([CH:17]=[CH:18][C:19]=1[F:20])[CH:15]=O.C[O-:22].[Na+].CO>C(OC)(OC)OC>[F:11][C:12]1[CH:13]=[C:14]([CH:15]=[CH:2][C:3]([C:5]2[CH:6]=[CH:7][CH:8]=[CH:9][C:10]=2[OH:22])=[O:4])[CH:17]=[CH:18][C:19]=1[F:20]

参加物

6

反応物 4

HCID 887MethanolHCID 68490alpha-HydroxyacetophenoneHCID 5880883,4-DifluorobenzaldehydeHCID 10942334Sodium Methoxide

生成物 1

HCID 54335129HCID 54335129、化合物

試薬・触媒・溶媒 1

HCID 9005Trimethyl orthoformate溶媒

実験手順

A mixture of 2-hydroxyacetophenone on Wang resin (2.0 g, 1.76 mmol) was swelled in trimethyl orthoformate (20 mL) for 10 min. 3,4-Difluorobenzaldehyde (6.0 mmol) was added and 25% NaOMe in MeOH (0.86 g, 4.0 mmol) was added to the mixture dropwise over 30 min. The mixture was then stirred for an additional 0.5 h. The resin was filtered and washed with alternating MeOH and CH2Cl2 (×5) and dried under high vacuum overnight to give 2.17 g of 3-(3,4-difluorophenyl)-1-(2-hydroxyphenyl)-2-propen-1-one on Wang resin.

後処理

  1. filtrationThe resin was filtered
  2. washwashed with alternating MeOH and CH2Cl2 (×5)
  3. customdried under high vacuum overnight

出典と根拠

ORDレコード
ord-1f04fad7e51048bb9f00dac5369e5540
出典データセット
uspto-grants-2002_05
特許番号
US06384057B1

反応ノート

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