Acetic Acid → HCID 135494373、化合物

HRID 1934498ノート

反応式

HRID 1934498 の反応式
[F:1][C:2]1[CH:3]=[C:4]([CH:9]([CH2:20][C:21]([C:23]2[CH:28]=[CH:27][C:26]([Cl:29])=[CH:25][CH:24]=2)=O)[CH2:10][C:11]([C:13]2[CH:18]=[CH:17][CH:16]=[CH:15][C:14]=2[OH:19])=O)[CH:5]=[CH:6][C:7]=1[F:8].CC(O)=O.C[N:35](C)C=O>>[Cl:29][C:26]1[CH:27]=[CH:28][C:23]([C:21]2[N:35]=[C:11]([C:13]3[CH:18]=[CH:17][CH:16]=[CH:15][C:14]=3[OH:19])[CH:10]=[C:9]([C:4]3[CH:5]=[CH:6][C:7]([F:8])=[C:2]([F:1])[CH:3]=3)[CH:20]=2)=[CH:24][CH:25]=1

参加物

4

反応物 3

HCID 176Acetic AcidHCID 6228DimethylformamideHCID 18679597HCID 18679597、化合物

生成物 1

HCID 135494373HCID 135494373、化合物

反応条件

温度
100 °C

実験手順

A mixture of 3-(3,4-difluorophenyl)-1-(2-hydroxyphenyl)-5-(4-chlorophenyl)-1,5-pentanedione on Wang resin (2.0 g, 1.76 mmol), NH4OAc (0.80 g), and AcOH (1.0 mL) in dimethylformamide (20 mL) was heated at 100° C. for 18 h. The resin was filtered, and washed with dimethylformamide (×2) and alternating MeOH and CH2Cl2 (×5), and dried under high vacuum overnight. The dried resin was treated with 50% TFA/CH2Cl2 (15 mL) for 1 h. After filtration of the reaction mixture, the filtrate was concentrated to dryness. The residue was repeatedly dissolved in CH2Cl2 (10 mL) and concentrated to remove traces of TFA, and lyophilized to give 2-[6-(4-chlorophenyl)-4-(3,4-difluoro-phenyl)-pyridin-2-yl]-phenol; mp 146-148° C.; 1H NMR (DMSO-d6) d 6.75 (m, 1H), 7.00 (m, 2H), 7.35 (m, 2H), 7.57 (m, 1H), 7.69 (d, J=8.6 Hz, 2H), 7.95 (d, J=8.6 Hz, 1H), 8.18 (d, J=8.6 Hz, 2H), 8.32 (m, 2H), 14.00 (s, 1H); IR (KBr) 1606 cm−1; MS [M+1] m/z=394. Anal. calcd for C23H14ClF2NO: C, 70.15; H, 3.58; N, 3.50; Found: C, 69.98; H, 3.51; N, 1.80.

後処理

  1. filtrationThe resin was filtered
  2. washwashed with dimethylformamide (×2)
  3. customdried under high vacuum overnight
  4. additionThe dried resin was treated with 50% TFA/CH2Cl2 (15 mL) for 1 h
  5. filtrationAfter filtration of the reaction mixture
  6. concentrationthe filtrate was concentrated to dryness
  7. dissolutionThe residue was repeatedly dissolved in CH2Cl2 (10 mL)
  8. concentrationconcentrated
  9. customto remove traces of TFA

出典と根拠

ORDレコード
ord-18d0aa1e6c444b3a84862b570a558a61
出典データセット
uspto-grants-2002_05
特許番号
US06384057B1

反応ノート

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