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Acetic Acid → Ethyl 1-((4-methoxy-2,3,5-trimethylphenylamino)methyl)-cyclobutanecarboxylate

HRID 2103063
ノート
印刷プレビュー

反応式

HRID 2103063 の反応式
[CH3:1][O:2][C:3]1[C:9]([CH3:10])=[CH:8][C:6]([NH2:7])=[C:5]([CH3:11])[C:4]=1[CH3:12].[CH:13]([C:15]1([C:19]([O:21][CH2:22][CH3:23])=[O:20])[CH2:18][CH2:17][CH2:16]1)=O.[BH-](OC(C)=O)(OC(C)=O)OC(C)=O.[Na+].C(O)(=O)C>ClCCl.O>[CH3:1][O:2][C:3]1[C:9]([CH3:10])=[CH:8][C:6]([NH:7][CH2:13][C:15]2([C:19]([O:21][CH2:22][CH3:23])=[O:20])[CH2:18][CH2:17][CH2:16]2)=[C:5]([CH3:11])[C:4]=1[CH3:12]
参加物実験手順後処理出典と根拠反応ノート

参加物

7

反応物 4

HCID 176Acetic AcidHCID 5049666Sodium triacetoxyborohydrideHCID 12226109Ethyl 1-formylcyclobutanecarboxylateHCID 147002344-Methoxy-2,3,5-trimethylaniline

生成物 1

HCID 86605498Ethyl 1-((4-methoxy-2,3,5-trimethylphenylamino)methyl)-cyclobutanecarboxylate

試薬・触媒・溶媒 2

HCID 962
Water
溶媒
HCID 6344Dichloromethane溶媒

実験手順

To a solution of 4-methoxy-2,3,5-trimethylaniline (400 mg) in dichloromethane (24 mL) was added ethyl 1-formylcyclobutanecarboxylate, prepared as described in Step 1 (377.8 μL). Then NaBH(OAc)3 (771.4 mg) and acetic acid (152.2 μL) were added sequentially. After 3.5 h, water was added. The two layers were separated and the aqueous layer was extracted with more dichloromethane. The combined organic phases were washed with brine, dried and evaporated. Elution of the residue on a silica column (EtOAc/DCM, 0-5%) gave ethyl 1-((4-methoxy-2,3,5-trimethylphenylamino)methyl)-cyclobutanecarboxylate (400 mg) as an oil. 1H-NMR, (300 MHz, CDCl3) δ=6.37 (s,1H), 4.262-3.974 (q, 2H), 3.63 (s, 3H), 3.745-3.474 (br s, 1H), 3.41 (s, 2H), 2.693-2.339 (m, 2H), 2.27 (s, 3H), 2.21, (s, 3H), 2.14-1.818, (m, 4H), 2.02, (s, 3H), 1.333-1.174 (t, 3H) ppm., 13C-NMR, (75 MHz, CDCl3) δ=176.51, 142.52, 129.68, 128.09, 119.78, 110.29, 60.85, 60.37, 50.67, 47.2, 28.43, 16.38, 15.9, 14.3, 12.94, 12.85 ppm.

後処理

  1. customprepared
  2. customThe two layers were separated
  3. extractionthe aqueous layer was extracted with more dichloromethane
  4. washThe combined organic phases were washed with brine
  5. customdried
  6. customevaporated
  7. washElution of the residue on a silica column (EtOAc/DCM, 0-5%)

出典と根拠

ORDレコード
ord-ca1eeb87eb074c43a2518b04b25edb76
出典データセット
uspto-grants-2009_08
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US07576094B2

反応ノート

読み込み中…

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