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Sulfuric Acid → 3-(Toluene-2-sulfonylamino)-thiophene-2-carboxylic acid tert-butyl ester

HRID 2193898
ノート
印刷プレビュー

反応式

HRID 2193898 の反応式
[C:1]1([CH3:19])[C:2]([S:7]([NH:10][C:11]2[CH:15]=[CH:14][S:13][C:12]=2[C:16]([OH:18])=[O:17])(=[O:9])=[O:8])=[CH:3][CH:4]=[CH:5][CH:6]=1.OS(O)(=O)=O>>[C:1]([O:17][C:16]([C:12]1[S:13][CH:14]=[CH:15][C:11]=1[NH:10][S:7]([C:2]1[C:1]([CH3:19])=[CH:6][CH:5]=[CH:4][CH:3]=1)(=[O:9])=[O:8])=[O:18])([CH3:19])([CH3:2])[CH3:6]
参加物実験手順後処理出典と根拠反応ノート

参加物

3

反応物 2

HCID 1118Sulfuric AcidHCID 224961893-(Toluene-2-sulfonylamino)-thiophene-2-carboxylic acid

生成物 1

HCID 207757763-(Toluene-2-sulfonylamino)-thiophene-2-carboxylic acid tert-butyl ester収率 146.8%

実験手順

To a cold (−40° C.) mixture of 3-(Toluene-2-sulfonylamino)-thiophene-2-carboxylic acid (1.5 g, 5.05 mmol) in 1,4-dioxane/CHCl, (1:2, 12 mL) was bubbled 2-methyl-2-propene gas (15 mL) in a sealed tube. To this was added Conc. H2SO4 (0.070 mL, 1.3 mmol) and slowly warmed up to room temperature. The resultant reaction mixture was heated at 70° C. for 2.5 days in a sealed tube, cooled to −40° C., stopper was removed. The reaction mixture was slowly brought up to room temperature and stirred until the excess gas is released. The mixture was extracted with EtOAc, washed with aq. NaHCO3 solution, brine and dried. Evaporation of the solvent and purification of the residue on silica gel using EtOAc/hexane (1:10) as an eluent furnished 3-(Toluene-2-sulfonylamino)-thiophene-2-carboxylic acid tert-butyl ester (1.31 g, 73.5% based on 90% conversion). 1H NMR (CDCl3, 300 MHz) 9.89 (s, 1H), 8.01 (d, J=7.9 Hz, 1H), 7.43 (dt, J=7.5 Hz, 1.5 Hz, 1H), 7.3-7.25 (m, 3H), 7.2 (d, J=5.4 Hz, 1H), 2.69 (s, 3H), 1.56 (s, 9H).

後処理

  1. customwas bubbled 2-methyl-2-propene gas (15 mL) in a sealed tube
  2. customThe resultant reaction mixture
  3. temperaturewas heated at 70° C. for 2.5 days in a sealed tube
  4. temperaturecooled to −40° C.
  5. customstopper was removed
  6. customwas slowly brought up to room temperature
  7. extractionThe mixture was extracted with EtOAc
  8. washwashed with aq. NaHCO3 solution, brine
  9. customdried
  10. customEvaporation of the solvent and purification of the residue on silica gel

出典と根拠

ORDレコード
ord-965328ee2039420cb75ef1c503bdaec4
出典データセット
uspto-grants-2012_12
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08329924B2

反応ノート

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