化工社化工社 化学情報印刷レポート · 研究参考用
Nitric Acid → 2-Nitro-4-nonylphenol
関与物質
| 役割 | 名称 | HCID | 仕込み量 |
|---|---|---|---|
| 反応物 | Nitric Acid | HCID 944 | — |
| 反応物 | 4-Nonylphenol | HCID 1752 | — |
| 溶媒 | Acetic Acid | HCID 176 | — |
| 生成物 | 2-Nitro-4-nonylphenol | HCID 18183548 | 78% |
反応手順
10 g of 4-nonylphenol (manufactured by Tokyo Kasei K.K., containing 10% of ortho compound) was dissolved in 30 ml of acetic acid and to the resulting solution was added 20 ml of 30% solution of nitric acid at 5°-10° C. for 2 hours. After 10 minutes, the resulting solution was treated with 50 g of ice water and then extracted with three 50-ml portions of ether. The ether was distilled off and then the residue was isolated using a silica gel column to obtain 9.33 g of the desired product in a 78% yield.
情報源と証拠
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| 特許番号 | US05213888 |
| 出典データセット | uspto-grants-1993_05 |
| ORD ID | ord-06b804ffcfc54dfab60084ee8966f56c |
| 出典メモ | uspto-grants-1993_05 |