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HRID 2601作成日:2026年10月24日

Chlorotrimethylsilane → 8-Trimethylsilyl-2,2,6,6-tetramethylbenzo[1,2-d:5,4-d']-bis(1,3)oxathiole

https://huagongshe.com/ja/reaction/2601

反応式

関与物質

役割名称HCID仕込み量
反応物ChlorotrimethylsilaneHCID 6397—
反応物2,2,6,6-Tetramethylbenzo[1,2-d:5,4-d']bis(1,3)oxathioleHCID 18785228—
反応物ButyllithiumHCID 178418339—
溶媒TetrahydrofuranHCID 8028—
生成物8-Trimethylsilyl-2,2,6,6-tetramethylbenzo[1,2-d:5,4-d']-bis(1,3)oxathioleHCID 18785237—

反応手順

The reaction was performed under an argon atmosphere using deoxygenated solvents. 2,2,6,6-tetramethylbenzo[1,2-d:5,4-d']-bis(1,3)oxathiole (6.0 g, 23.6 mmol) was dissolved in dry THF (120 mL). The mixture was cooled on an ice-bath and n-butyllithium (10.8 mL, 2.5M in hexane) was added dropwise over 10 min. After 15 min, chlorotrimethylsilane (6.0 mL, 47.2 mmol) was added dropwise over 5 min. After another 15 min, the reaction mixture was quenched with dietyl ether/aq. NaHCO3, the aqueous layer was extracted with ether and the combined organic layers were washed with water and dried (Na2SO4). After evaporation and chromatography (silica gel, chloroform) essentially pure product (6.3 g, 92%) could be collected.

情報源と証拠

DOI10.6084/m9.figshare.5104873.v1
特許番号US05728370
出典データセットuspto-grants-1998_03
ORD IDord-3fd18c20fe384f209c75449594a77dfc
出典メモuspto-grants-1998_03