関与物質
| 役割 | 名称 | HCID | 仕込み量 |
|---|
| 反応物 | Acetic Acid | HCID 176 | — |
| 反応物 | Bazedoxifene | HCID 154257 | — |
| 溶媒 | Acetone | HCID 180 | — |
| 生成物 | Bazedoxifene Acetate | HCID 154256 | — |
反応手順
Bazedoxifene free base from example 17 or from example 19 (10 g, 21.2 mmol) was suspended in acetone (80 ml) and heated to 50-55° C. After getting a clear solution, a mixture of acetic acid (1.4 g, 23.3 mmol) and acetone (10 ml) was added slowly. Then the reaction mixture was allowed to cool at 20-25° C., stirred for 2 hrs, filtered the product formed, washed with acetone (20 ml) and dried under vacuum to afford the title compound in high yield and high purity (12.7 g, 95%) M.R: 176-181° C. HPLC: 99.9%.
情報源と証拠
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|
| 特許番号 | US08889896B2 |
|---|
| 出典データセット | uspto-grants-2014_11 |
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| ORD ID | ord-caeb91aa393c43648984eab217e048c1 |
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| 出典メモ | uspto-grants-2014_11 |
|---|