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Acetic Acid → (R)-S-Ethyl 2-(2,2-dimethyl-5-oxo-1,3-dioxolan-4-yl)ethanethioate

HRID 407871
ノート
印刷プレビュー

反応式

HRID 407871 の反応式
[CH3:1][C:2]1([CH3:12])[O:6][C@H:5]([CH2:7][C:8]([OH:10])=O)[C:4](=[O:11])[O:3]1.[CH2:13]([SH:15])[CH3:14].C1CCC(N=C=NC2CCCCC2)CC1.C(O)(=O)C>C(Cl)Cl.CN(C)C1C=CN=CC=1.CCOCC>[CH3:12][C:2]1([CH3:1])[O:6][C@H:5]([CH2:7][C:8](=[O:10])[S:15][CH2:13][CH3:14])[C:4](=[O:11])[O:3]1
参加物実験手順後処理出典と根拠反応ノート

参加物

8

反応物 4

HCID 176Acetic AcidHCID 6343EthanethiolHCID 10868DicyclohexylcarbodiimideHCID 108449602-((4R)-2,2-dimethyl-5-oxo-1,3-dioxolan-4-yl)acetic acid

生成物 1

HCID 53627664(R)-S-Ethyl 2-(2,2-dimethyl-5-oxo-1,3-dioxolan-4-yl)ethanethioate収率 71.8%

試薬・触媒・溶媒 3

HCID 14284
4-(Dimethylamino)pyridine
触媒
HCID 3283Diethyl Ether溶媒
HCID 6344Dichloromethane溶媒

実験手順

(R)-2-(2,2-Dimethyl-5-oxo-1,3-dioxolan-4-yl)acetic acid (25 g, 144 mmol) was dissolved in CH2Cl2 (500 mL) and cooled in an ice bath. Ethanethiol (21.2 mL, 287 mmol) and N,N-dimethylpyridin-4-amine (0.351 g, 2.87 mmol) were added followed by DCC (35.5 g, 172 mmol). This mixture was stirred in ice bath for 1 hour, and then 2 hours at ambient temperature. Acetic acid (45 mL) was added and then stirred the mixture for 10 minutes. The reaction mixture was then poured into vigorously stirred ether (400 mL) and filtered. The filtrate was washed with 10% sodium carbonate, water, 0.5 N HCl, water and brine. The organic layer was dried over Na2SO4, filtered and concentrated. The residue was purified over silica gel (1-5-10% EtOAc in hexanes) to afford (R)—S-ethyl 2-(2,2-dimethyl-5-oxo-1,3-dioxolan-4-yl)ethanethioate (22.5 g, 103 mmol, 71.8% yield) as a clear colorless oil that solidified to a white solid.

後処理

  1. temperaturecooled in an ice bath
  2. custom2 hours
  3. customat ambient temperature
  4. stirringstirred the mixture for 10 minutes
  5. filtrationfiltered
  6. washThe filtrate was washed with 10% sodium carbonate, water, 0.5 N HCl, water and brine
  7. dry with materialThe organic layer was dried over Na2SO4
  8. filtrationfiltered
  9. concentrationconcentrated
  10. customThe residue was purified over silica gel (1-5-10% EtOAc in hexanes)

出典と根拠

ORDレコード
ord-f2be078a86ea4a7aaf772ca9c1280ad2
出典データセット
uspto-grants-2014_06
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08754226B2

反応ノート

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