Water → 1-Cyclopropyl-4-nitronaphthalene

HRID 448139

反応式

HRID 448139 の反応式
[N:1]([O-:3])=[O:2].[Na+].[CH:5]1([C:8]2[C:17]3[C:12](=[CH:13][CH:14]=[CH:15][CH:16]=3)[CH:11]=[CH:10][CH:9]=2)[CH2:7][CH2:6]1.O>CCOC(C)=O>[CH:5]1([C:8]2[C:17]3[C:12](=[CH:13][CH:14]=[CH:15][CH:16]=3)[C:11]([N+:1]([O-:3])=[O:2])=[CH:10][CH:9]=2)[CH2:7][CH2:6]1

参加物

5

反応物 3

HCID 962WaterHCID 146686931-CyclopropylnaphthaleneHCID 23668193Sodium Nitrite

生成物 1

HCID 598130791-Cyclopropyl-4-nitronaphthalene収率 64%

試薬・触媒・溶媒 1

HCID 8857Ethyl Acetate溶媒

反応条件

温度
0 °C

実験手順

Sodium nitrite (30 mL) was slowly added (over 2 hours) to 1-cyclopropyl-naphthalene (6.4 g, 38 mmol) stirred at 0° C. The reaction mixture was stirred at 0° C. for an extra 30 min and then was slowly poured into ice. Water was added, followed by EtOAc. After extraction, the organic layer was washed with a 1% aqueous solution of NaOH, then washed with water, dried over sodium sulfate, filtered and concentrated under reduced pressure. The residue was purified by silica gel chromatography to yield 1-cyclopropyl-4-nitro-naphthalene (5.2 g, 64%).

後処理

  1. stirringThe reaction mixture was stirred at 0° C. for an extra 30 min
  2. additionwas slowly poured into ice
  3. extractionAfter extraction
  4. washthe organic layer was washed with a 1% aqueous solution of NaOH
  5. washwashed with water
  6. dry with materialdried over sodium sulfate
  7. filtrationfiltered
  8. concentrationconcentrated under reduced pressure
  9. customThe residue was purified by silica gel chromatography

出典と根拠

ORDレコード
ord-899fea0b06b243edb9289c36e7685495
出典データセット
uspto-grants-2013_07
特許番号
US08481581B2

関連ノート

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