ホームMCPワークベンチSkills
ホームワークベンチ通知マイページ
llms.txt · MCPガイドプライバシーポリシー · 利用規約 · サポートv1.8.0
  1. ホーム
  2. /反応

(Diethylamino)sulfur trifluoride → Dimethyl 5-fluoromethylisophthalate

HRID 473235
ノート
印刷プレビュー

反応式

HRID 473235 の反応式
O[CH2:2][C:3]1[CH:4]=[C:5]([C:13]([O:15][CH3:16])=[O:14])[CH:6]=[C:7]([CH:12]=1)[C:8]([O:10][CH3:11])=[O:9].C(N(S(F)(F)[F:23])CC)C>C(Cl)Cl>[F:23][CH2:2][C:3]1[CH:4]=[C:5]([C:13]([O:15][CH3:16])=[O:14])[CH:6]=[C:7]([CH:12]=1)[C:8]([O:10][CH3:11])=[O:9]
参加物実験手順後処理出典と根拠反応ノート

参加物

4

反応物 2

HCID 123472(Diethylamino)sulfur trifluorideHCID 13907324Dimethyl 5-(hydroxymethyl)isophthalate

生成物 1

HCID 67254949Dimethyl 5-fluoromethylisophthalate収率 78%

試薬・触媒・溶媒 1

HCID 6344Dichloromethane溶媒

実験手順

Under Ar atmosphere, with ice-cooled, to a solution of dimethyl 5-hydroxymethylisophthalate (32) (3.36 g, 15.0 mmol) in CH2Cl2 (150 mL, 0.1 M solution) was slowly added dropwise (diethylamino)sulfur trifluoride (4.00 mL, 30.5 mmol), and stirred for 2 hours at a room temperature. TLC was used to confirm the progress of the reaction. Then, the reaction was quenched with MeOH (150 mL). The solvent was removed under reduced pressure. The residue was subjected to extraction with EtOAc and a saturated sodium hydrogen carbonate aqueous solution (three times). The organic layer was washed with a saturated sodium chloride aqueous solution, dried over anhydrous sodium sulfate, and evaporated under reduced pressure to remove the solvent. The residue was purified by neutral silica gel column chromatography (hexane:EtOAc=10:1) to isolate dimethyl 5-fluoromethylisophthalate (33) (2.57 g, 78%) as white crystals.

後処理

  1. customthe progress of the reaction
  2. customThen, the reaction was quenched with MeOH (150 mL)
  3. customThe solvent was removed under reduced pressure
  4. extractionThe residue was subjected to extraction with EtOAc
  5. washThe organic layer was washed with a saturated sodium chloride aqueous solution
  6. dry with materialdried over anhydrous sodium sulfate
  7. customevaporated under reduced pressure
  8. customto remove the solvent
  9. customThe residue was purified by neutral silica gel column chromatography (hexane:EtOAc=10:1)

出典と根拠

ORDレコード
ord-f8ba0628382f48d48f715655aed4e2c2
出典データセット
uspto-grants-2014_01
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08633304B2

反応ノート

読み込み中…

このページの内容参加物実験手順後処理出典と根拠反応ノート