Hydrochloric Acid → 1-Benzoyl-3-[3-[4-benzyl-4-(propionylaminomethyl)piperid 1-yl]propyl]-3-(3,4-dichlorophenyl)piperidine hydrochloride

HRID 50065ノート

反応式

HRID 50065 の反応式
O.Cl.Cl.NCC1(CC2C=CC=CC=2)CCN(CCCC2(C3C=CC([Cl:35])=C(Cl)C=3)CCCN([C:21](=[O:28])[C:22]3C=CC=C[CH:23]=3)C2)CC1.[NH2:44][CH2:45][C:46]1([CH2:77][C:78]2[CH:83]=[CH:82][CH:81]=[CH:80][CH:79]=2)[CH2:51][CH2:50][N:49]([CH2:52][CH2:53][CH2:54][C:55]2([C:69]3[CH:74]=[CH:73][C:72]([Cl:75])=[C:71]([Cl:76])[CH:70]=3)[CH2:60][CH2:59][CH2:58][N:57]([C:61](=[O:68])[C:62]3[CH:67]=[CH:66][CH:65]=[CH:64][CH:63]=3)[CH2:56]2)[CH2:48][CH2:47]1.Cl.Cl.C(N(CC)CC)C.C(Cl)(=O)CC.Cl>C(Cl)Cl>[ClH:35].[C:61]([N:57]1[CH2:58][CH2:59][CH2:60][C:55]([CH2:54][CH2:53][CH2:52][N:49]2[CH2:50][CH2:51][C:46]([CH2:77][C:78]3[CH:79]=[CH:80][CH:81]=[CH:82][CH:83]=3)([CH2:45][NH:44][C:21](=[O:28])[CH2:22][CH3:23])[CH2:47][CH2:48]2)([C:69]2[CH:74]=[CH:73][C:72]([Cl:75])=[C:71]([Cl:76])[CH:70]=2)[CH2:56]1)(=[O:68])[C:62]1[CH:67]=[CH:66][CH:65]=[CH:64][CH:63]=1

参加物

6

反応物 4

HCID 313Hydrochloric AcidHCID 8471TriethylamineHCID 62324Propionyl chlorideHCID 1317216533-[3-[4-(Aminomethyl)-4-benzylpiperid-1-yl]propyl]-1-benzoyl-3-(3,4-dichlorophenyl)piperidine dihydrochloride hemihydrate

生成物 1

HCID 227418071-Benzoyl-3-[3-[4-benzyl-4-(propionylaminomethyl)piperid 1-yl]propyl]-3-(3,4-dichlorophenyl)piperidine hydrochloride収率 121.4%

試薬・触媒・溶媒 1

HCID 6344Dichloromethane溶媒

実験手順

A solution of 0.6 g of the compound obtained in EXAMPLE 9 and 0.18 ml of triethylamine in 10 ml of DCM is cooled to 0° C., 0.1 ml of propionyl chloride is added dropwise and the mixture is stirred for 5 minutes. It is concentrated under vacuum, the residue is extracted with AcOEt, the organic phase is washed twice with water and dried over MgSO4 and the solvent is evaporated off under vacuum. The residue is chromatographed on silica H using DCM and then a DCM/MeOH mixture (9515; v/v) as the eluent. The product obtained is taken up with ethereal hydrogen chloride and the precipitate formed is filtered off to give 0.37 g of the expected product.

後処理

  1. concentrationIt is concentrated under vacuum
  2. extractionthe residue is extracted with AcOEt
  3. washthe organic phase is washed twice with water
  4. dry with materialdried over MgSO4
  5. customthe solvent is evaporated off under vacuum
  6. customThe residue is chromatographed on silica H
  7. customThe product obtained
  8. customthe precipitate formed
  9. filtrationis filtered off

出典と根拠

ORDレコード
ord-957d016a49264fb2b36f9115c8e10356
出典データセット
uspto-grants-2004_03
特許番号
US06710042B2

反応ノート

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